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首页> 外文期刊>Advanced materials for optics and electronics >Luminescent Colloidal Dispersion Of Silicon Quantum Dots From Microwave Plasma Synthesis: Exploring The Photoluminescence Behavior Across The Visible Spectrum
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Luminescent Colloidal Dispersion Of Silicon Quantum Dots From Microwave Plasma Synthesis: Exploring The Photoluminescence Behavior Across The Visible Spectrum

机译:微波等离子体合成中硅量子点的胶态色散:探索可见光谱范围内的光致发光行为

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摘要

Aiming for a more practical route to highly stable visible photoluminescence (PL) from silicon, a novel approach to produce luminescent silicon nanoparticles (Si-NPs) is developed. Single crystalline Si-NPs are synthesized by pyrolysis of silane (SiH_4) in a microwave plasma reactor at very high production rates (0.1-10gh~(-1)). The emission wavelength of the Si-NPs is controlled by etching them in a mixture of hydrofluoric acid and nitric acid. Emission across the entire visible spectrum is obtained by varying the etching time. It is observed that the air oxidation of the etched Si-NPs profoundly affects their optical properties, and causes their emission to blue-shift and diminish in intensity with time. Modification of the silicon surface by UV-induced hydrosilylation also causes a shift in the spectrum. The nature of the shift (red/blue) is dependent on the emission wavelength of the etched Si-NPs. In addition, the amount of shift depends on the type of organic ligand on the silicon surface and the UV exposure time. The surface modification of Si-NPs with different alkenes results in highly stable PL and allows their dispersion in a variety of organic solvents. This method of producing macroscopic quantities of Si-NPs with very high PL stability opens new avenues to applications of silicon quantum dots in optoelectronic and biological fields, and paves the way towards their commercialization.
机译:为了从硅获得更稳定的可见光致发光(PL)的实用途径,开发了一种生产发光硅纳米粒子(Si-NPs)的新颖方法。通过在微波等离子体反应器中以非常高的生产率(0.1-10gh〜(-1))对硅烷(SiH_4)进行热解来合成单晶Si-NP。通过在氢氟酸和硝酸的混合物中蚀刻Si-NP,可以控制它们的发射波长。通过改变蚀刻时间可以获得整个可见光谱的发射。观察到,被腐蚀的Si-NP的空气氧化深刻地影响了它们的光学性能,并导致它们的发射蓝移并且强度随时间减小。通过紫外线诱导的氢化硅烷化对硅表面进行的改性也会引起光谱的移动。偏移的性质(红色/蓝色)取决于蚀刻的Si-NP的发射波长。另外,偏移量取决于硅表面上有机配体的类型和紫外线照射时间。用不同的烯烃对Si-NP进行表面改性可产生高度稳定的PL,并使其分散在多种有机溶剂中。这种产生具有极高PL稳定性的宏观数量的Si-NP的方法为硅量子点在光电和生物领域的应用开辟了新途径,并为它们的商业化铺平了道路。

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