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PNAS Plus: Moving gating charges through the gating pore in a Kv channel voltage sensor

机译:PNAS Plus:通过Kv通道电压传感器中的选通孔移动选通电荷

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摘要

Voltage sensor domains (VSDs) regulate ion channels and enzymes by transporting electrically charged residues across a hydrophobic VSD constriction called the gating pore or hydrophobic plug. How the gating pore controls the gating charge movement presently remains debated. Here, using saturation mutagenesis and detailed analysis of gating currents from gating pore mutations in the Shaker Kv channel, we identified statistically highly significant correlations between VSD function and physicochemical properties of gating pore residues. A necessary small residue at position S240 in S1 creates a “steric gap” that enables an intracellular access pathway for the transport of the S4 Arg residues. In addition, the stabilization of the depolarized VSD conformation, a hallmark for most Kv channels, requires large side chains at positions F290 in S2 and F244 in S1 acting as “molecular clamps,” and a hydrophobic side chain at position I237 in S1 acting as a local intracellular hydrophobic barrier. Finally, both size and hydrophobicity of I287 are important to control the main VSD energy barrier underlying transitions between resting and active states. Taken together, our study emphasizes the contribution of several gating pore residues to catalyze the gating charge transfer. This work paves the way toward understanding physicochemical principles underlying conformational dynamics in voltage sensors.
机译:电压传感器域(VSD)通过将带电荷的残基跨过称为门控孔或疏水塞的疏水性VSD缩颈传输来调节离子通道和酶。目前如何对门控孔控制门控电荷运动仍有争议。在这里,使用饱和诱变和Shaker Kv通道中门控孔突变的门控电流的详细分析,我们确定了VSD功能与门控孔残留物的理化性质之间的统计学高度相关性。 S1的S240位置上必要的小残基会形成“空间缺口”,从而使细胞内通路能够转运S4 Arg残基。此外,去极化VSD构象的稳定(大多数Kv通道的标志)要求在S2中的F290位置和S1中的F244位置有较大的侧链充当“分子钳”,而S1的I237位置处的疏水性侧链则充当局部细胞内疏水屏障。最后,I287的大小和疏水性对于控制处于静止状态和活动状态之间过渡的主要VSD能垒非常重要。两者合计,我们的研究强调了几个门控孔残留物对催化门控电荷转移的贡献。这项工作为理解电压传感器构象动力学基础的理化原理铺平了道路。

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