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Onset of frictional slip by domain nucleation in adsorbed monolayers

机译:在吸附的单分子层中通过畴核形成摩擦滑移

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摘要

It has been known for centuries that a body in contact with a substrate will start to slide when the lateral force exceeds the static friction force. Yet the microscopic mechanisms ruling the crossover from static to dynamic friction are still the object of active research. Here, we analyze the onset of slip of a xenon (Xe) monolayer sliding on a copper (Cu) substrate. We consider thermal-activated creep under a small external lateral force, and observe that slip proceeds by the nucleation and growth of domains in the commensurate interface between the film and the substrate. We measure the activation energy for the nucleation process considering its dependence on the external force, the substrate corrugation, and particle interactions in the film. To understand the results, we use the classical theory of nucleation and compute analytically the activation energy which turns out to be in excellent agreement with numerical results. We discuss the relevance of our results to understand experiments on the sliding of adsorbed monolayers.
机译:几个世纪以来已知,当横向力超过静摩擦力时,与基板接触的物体将开始滑动。然而,决定从静摩擦到动摩擦的交叉的微观机制仍然是积极研究的对象。在这里,我们分析了在铜(Cu)基板上滑动的氙(Xe)单层滑移的开始。我们考虑在较小的外部横向力作用下的热激活蠕变,并观察到滑移是通过薄膜和基材之间相应界面中晶畴的成核和生长而进行的。考虑到成核过程对外力,基底波纹以及薄膜中颗粒相互作用的依赖性,我们测量了成核过程的活化能。为了理解结果,我们使用经典的成核理论,并分析计算了活化能,该活化能与数值结果非常吻合。我们讨论了我们的结果的相关性,以了解吸附单层滑动的实验。

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