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Measurement of Diffusion and Segregation in Semiconductor Quantum Dots and Quantum Wells by Transmission Electron Microscopy: A Guide

机译:透射电子显微镜测量半导体量子点和量子阱中扩散和偏析的指南

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摘要

Strategies are discussed to distinguish interdiffusion and segregation and to measure key parameters such as diffusivities and segregation lengths in semiconductor quantum dots and quantum wells by electron microscopy methods. Spectroscopic methods are usually necessary when the materials systems are complex while imaging methods may suffice for binary or simple ternary compounds where atomic intermixing is restricted to one type of sub-lattice. The emphasis on methodology should assist microscopists in evaluating and quantifying signals from electron micrographs and related spectroscopic data. Examples presented include CdS/ZnS core/shell particles and SiGe, InGaAs and InGaN quantum wells.
机译:讨论了通过电子显微镜方法区分互扩散和偏析并测量关键参数(例如半导体量子点和量子阱中的扩散率和偏析长度)的策略。当材料系统复杂时,光谱方法通常是必需的,而成像方法可能满足二元或简单三元化合物的要求,其中原子混合仅限于一种子晶格。对方法的强调应有助于显微学家评估和量化来自电子显微照片和相关光谱数据的信号。展示的例子包括CdS / ZnS核/壳颗粒以及SiGe,InGaAs和InGaN量子阱。

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