首页> 美国卫生研究院文献>Nanomaterials >Time-Dependent Growth of Silica Shells on CdTe Quantum Dots
【2h】

Time-Dependent Growth of Silica Shells on CdTe Quantum Dots

机译:CdTe量子点上硅壳的时变生长

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The purpose of this study is to investigate the time dependent growth of silica shells on CdTe quantum dots to get their optimum thicknesses for practical applications. The core/shell structured silica-coated CdTe quantum dots (CdTe/SiO2 QDs) were synthesized by the Ströber process, which used CdTe QDs co-stabilized by mercaptopropionic acid. The coating procedure used silane primer (3-mercaptopropyltrimethoxysilane) in order to make the quantum dots (QDs) surface vitreophilic. The total size of QDs was dependent on both the time of silica shell growth in the presence of sodium silicate, and on the presence of ethanol during this growth. The size of particles was monitored during the first 72 h using two principally different methods: Dynamic Light Scattering (DLS), and Scanning Electron Microscopy (SEM). The data obtained by both methods were compared and reasons for differences discussed. Without ethanol precipitation, the silica shell thickness grew slowly and increased the nanoparticle total size from approximately 23 nm up to almost 30 nm (DLS data), and up to almost 60 nm (SEM data) in three days. During the same time period but in the presence of ethanol, the size of CdTe/SiO2 QDs increased more significantly: up to 115 nm (DLS data) and up to 83 nm (SEM data). The variances occurring between silica shell thicknesses caused by different methods of silica growth, as well as by different evaluation methods, were discussed.
机译:这项研究的目的是研究CdTe量子点上硅壳的时间依赖性生长,以获取其实际应用中的最佳厚度。核/壳结构的二氧化硅包覆的CdTe量子点(CdTe / SiO2 QDs)通过Ströber工艺合成,该量子点使用通过巯基丙酸共稳定的CdTe QD。涂覆程序使用了硅烷底漆(3-巯基丙基三甲氧基硅烷),以使量子点(QD)表面呈玻璃态。 QD的总大小既取决于在硅酸钠存在下硅壳生长的时间,也取决于在该生长过程中乙醇的存在。在最初的72小时内,使用两种主要不同的方法监测颗粒的大小:动态光散射(DLS)和扫描电子显微镜(SEM)。比较了两种方法获得的数据并讨论了差异的原因。在没有乙醇沉淀的情况下,二氧化硅外壳的厚度缓慢增长,并在三天内使纳米颗粒的总尺寸从约23 nm增加到几乎30 nm(DLS数据),再增加到几乎60 nm(SEM数据)。在同一时间段但在乙醇的存在下,CdTe / SiO2 QD的尺寸增加得更为明显:高达115 nm(DLS数据)和83 nm(SEM数据)。讨论了由不同的二氧化硅生长方法以及不同的评估方法引起的二氧化硅壳厚度之间的差异。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号