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Copper Micro-Labyrinth with Graphene Skin: New Transparent Flexible Electrodes with Ultimate Low Sheet Resistivity and Superior Stability

机译:具有石墨烯表层的铜微迷宫:具有极低的薄层电阻率和出色稳定性的新型透明柔性电极

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摘要

We have developed self-assembled copper (Cu) micro-labyrinth (ML) with graphene skin for transparent flexible electrodes of optoelectronic devices. The Cu ML is simply formed by heating a thin Cu film with a 100-nm thickness on a SiO2/Si substrate at 950 °C under hydrogen ambient to block the oxidation. Moreover, the Cu ML can have graphene skin at the surface by inserting carbo-hydroxyl molecules (CxHy) during heating due to the catalytic decomposition of C–H bonds on the Cu surface. The Cu ML with graphene skin (Cu ML-G) has superior sheet resistivity below 5 Ω/sq and mechanical flexibility without cracks at the bending radius of 0.1 cm. Although the transmittance of Cu ML-G is a little lower (70%~80%) than that of conventional metallic nanowires electrodes (such as Ag, ~90% at the visible wavelength), it has good thermal stability in conductivity without any damage at 200 °C due to a micro-sized pattern and graphene skin which prohibits the surface migration of Cu atoms.
机译:我们开发了具有石墨烯表皮的自组装铜(Cu)微迷宫(ML),用于光电器件的透明柔性电极。 Cu ML可以简单地通过在950°C的氢气环境下在SiO2 / Si衬底上加热SiO2 / Si基板上厚度为100 nm的薄Cu膜来阻止氧化来形成。此外,由于铜表面C–H键的催化分解,通过在加热过程中插入碳羟基分子(CxHy),Cu ML可以在表面形成石墨烯皮。具有石墨烯表皮的Cu ML(Cu ML-G)在5Ω/ sq以下具有出色的薄层电阻率,并且在0.1 cm的弯曲半径处具有机械挠性而无裂纹。尽管Cu ML-G的透射率比常规金属纳米线电极(例如Ag,可见光波长下的〜90%)的透射率略低(70%〜80%),但它的导电性具有良好的热稳定性而不会受到任何损害在200°C的温度下,这是因为存在微尺寸的图案和石墨烯表皮,阻止了Cu原子的表面迁移。

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