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Optical and Electrical Properties of TTF-MPcs (M = Cu Zn) Interfaces for Optoelectronic Applications

机译:用于光电应用的TTF-MPcs(M = CuZn)接口的光学和电学性质

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摘要

Sandwich structures were fabricated by a vacuum deposition method using MPc (M = Cu, Zn), with a Tetrathiafulvalene (TTF) derivative, and Indium Tin Oxide (ITO) and aluminum electrodes. The structure and morphology of the deposited films were studied by IR spectroscopy, scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). The absorption spectra of TTF derivative-MPc (M = Cu, Zn) thin films deposited at room temperature were recorded in the spectral range 200–1000 nm. The optical band gap of the thin films was determined from the (αhν)1/2 vs. hν plot. The direct-current (DC) electrical properties of the glass/ITO/TTFderiv-MPc (M = Cu, Zn)/Al structures were also investigated. Changes in conductivity of the derivative-TTF-enriched Pc compounds suggest the formation of alternative paths for carrier conduction. At low voltages, forward current density obeys an ohmic I-V relationship; at higher voltages, conduction is mostly due to a space-charge-limited conduction (SCLC) mechanism.
机译:通过使用MPc(M = Cu,Zn),四硫富富瓦烯(TTF)衍生物,氧化铟锡(ITO)和铝电极的真空沉积方法制造三明治结构。通过红外光谱,扫描电子显微镜(SEM)和能量色散光谱(EDS)研究了沉积膜的结构和形貌。在室温下沉积的TTF衍生物-MPc(M = Cu,Zn)薄膜的吸收光谱记录在200–1000 nm的光谱范围内。薄膜的光学带隙由(αhν) 1/2 对hν曲线确定。还研究了玻璃/ ITO / TTFderiv-MPc(M = Cu,Zn)/ Al结构的直流电性能。富含TTF的衍生物的Pc化合物电导率的变化表明形成了载流子传导的替代路径。在低电压下,正向电流密度遵循欧姆I-V关系;在较高电压下,传导主要归因于空间电荷限制传导(SCLC)机制。

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