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High-Performance Resistance-Switchable Multilayers of Graphene Oxide Blended with 134-Oxadiazole Acceptor Nanocomposite

机译:高性能氧化石墨烯与134-恶二唑受体纳米复合材料的电阻可切换多层

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摘要

Graphene oxide (GO) has been actively utilized in nonvolatile resistive switching random access memory (ReRAM) devices due to solution-processability, accessibility for highly scalable device fabrication for transistor-based memory, and cross-bar memory arrays. Uncontrollable oxygen functional groups of GO, however, restrict its application. To obtain stable memory performance, 2-tert-butylphenyl-5-biphenyl-1,3,4-oxadiazole (PBD) a that can serve as 1,3,4-oxadiazole acceptor was carefully introduced onto the GO framework. Better stability was achieved by increasing the weight ratio of the chemical component from 2:1 to 10:1 in all GO-based solutions. Particularly, rewritable nonvolatile memory characteristics were dependent on the ratio between PBD and GO. PBD:GO devices with a proportion of 10:1 w/w exhibited better memory performance, possessed a higher ON/OFF ratio (>102) at a lower switching voltage of −0.67 V, and had a long retention ability. The interaction between PBD and GO can be demonstrated by transmission electron microscope, scanning electron microscope, thermogravimetric analysis, fourier transform infrared spectra, Raman spectra, X-ray diffraction, and fluorescence spectra. The superior ReRAM properties of the multilayers of GO blended with the PBD nanocomposite are attributed to electron traps caused by the strong electron acceptors.
机译:氧化石墨烯(GO)由于其解决方案可加工性,用于基于晶体管的存储器的高度可扩展器件制造的可访问性以及交叉开关存储阵列,已被积极地用于非易失性电阻开关随机存取存储器(ReRAM)器件中。但是,GO的不可控制的氧官能团限制了其应用。为了获得稳定的存储性能,将可以用作1,3,4-恶二唑受体的2-叔丁基苯基-5-联苯-1,3,4-恶二唑(PBD)a小心地引入到GO框架中。通过在所有基于GO的溶液中将化学成分的重量比从2:1增加到10:1,可以获得更好的稳定性。特别是,可重写的非易失性存储特性取决于PBD和GO之间的比率。比例为10:1 w / w的PBD:GO设备表现出更好的存储性能,在-0.67 V的较低开关电压下具有更高的开/关比(> 10 2 ),并且具有保留时间长。 PBD和GO之间的相互作用可以通过透射电子显微镜,扫描电子显微镜,热重分析,傅立叶变换红外光谱,拉曼光谱,X射线衍射和荧光光谱来证明。 GO多层与PBD纳米复合材料共混的卓越ReRAM性能归因于强电子受体引起的电子陷阱。

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