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Silica-Based RO Membranes for Separation of Acidic Solution

机译:硅胶基RO膜分离酸性溶液

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摘要

The development of acid separation membranes is important. Silica-based reverse osmosis (RO) membranes for sulfuric acid (H2SO4) solution separation were developed by using a counter diffusion chemical vapor deposition (CVD) method. Diphenyldimethoxysilane (DPhDMOS) was used as a silica precursor. The deposited membrane showed the H2SO4 rejection of 81% with a total flux of 5.8 kg m−2 h−1 from the 10−3 mol L−1 of H2SO4. The γ-alumina substrate was damaged by the permeation of the H2SO4 solution. In order to improve acid stability, the silica substrates were developed. The acid stability was checked by the gas permeation tests after immersing in 1 mol L−1 of the H2SO4 solution for 24 h. The N2 permeance decreased by 11% with the acid treatment through the silica substrate, while the permeance decreased to 94% through the γ-alumina substrate. The flux and the rejection through the DPhDMOS-derived membrane on the silica substrate were stable in the 70 wt % H2SO4 solution.
机译:酸分离膜的开发很重要。通过使用反扩散化学气相沉积(CVD)方法开发了用于分离硫酸(H2SO4)溶液的硅基反渗透(RO)膜。二苯基二甲氧基硅烷(DPhDMOS)用作二氧化硅前体。沉积的膜显示出的H2SO4排斥率为81%,从10 -3 摩尔的总通量为5.8 kg m −2 h -1 H2SO4的L −1 。 H2SO4溶液的渗透会损坏γ-氧化铝基材。为了提高酸稳定性,开发了二氧化硅基材。在1 mol L -1 的H2SO4溶液中浸泡24小时后,通过气体渗透测试检查其酸稳定性。通过二氧化硅基板进行酸处理后,N2的渗透率降低了11%,而通过γ-氧化铝基板的N2渗透率降低至94%。在70 wt%的H2SO4溶液中,通过二氧化硅衬底上DPhDMOS衍生的膜的通量和截留率稳定。

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