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Electrical Conductivity and Optical Properties of Pulsed Laser Deposited LaNi5 Nanoscale Films

机译:脉冲激光沉积LaNi5纳米薄膜的电导率和光学性质

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摘要

This work presents pulsed laser deposition as a method to obtain unoxidized LaNi5 nanoscale films and describes their temperature and thickness dependent electrical conductivity and the spectral dispersions of some optical properties. AB5-type rare earth element (REE)-nickel compounds are currently studied from both theoretical and practical points of view. Special challenges are posed during the preparation of these nanomaterials, which can be overcome using finely tuned parameters in a preparation process that always involves the use of high energies. Film deposition was made by laser—induced vaporization, with short and modulated impulses and electro–optical tuning of the quality factor, mainly on glass and one SiO2 substrate. Deposition geometry dependent linear thickness increase, between 1.5–2.5 nm per laser burst, was achieved. Film structures and phase compositions were determined using XRD and discussed in comparison with films obtained by similar deposition procedures. Temperature and scale dependent properties were determined by studying electrical conductivity and optical properties. Electrical conductivity was measured using the four-probe method. The observed semiconductor-like conductivity for film thicknesses up to 110 nm can be explained by thermal activation of electrons followed by inter-insular hopping or quantum tunneling, which, on the other hand, modulates the material’s native metallic conductance. Films with thicknesses above this value can be considered essentially metallic and bulk-like. The spectral behaviors of the refractive index and absorption coefficient were deduced from differential reflectance spectroscopy data acquired on a broad ultraviolet, visible, near- and mid-infrared (UV-VIS-NIR-MIR) domain, processed using the Kramers-Krönig formalism. Their study led to the identification of the allowed interband transitions. Electronic behavior in the energy bands near the Fermi level and in the surface and interface-states was described, discussing the differences between experimental data and the classical free-electron theoretical model applied for the bulk intermetallic alloy, in correlation with theoretical optical properties or experimental X-ray photoelectron spectroscopy (XPS) results from references. However, the dielectric-like shape of the reflectance of the thinnest film was in accordance with the Lorentz–Drude model.
机译:这项工作介绍了脉冲激光沉积作为获得未氧化LaNi5纳米级薄膜的方法,并描述了它们的温度和厚度相关的电导率以及某些光学特性的光谱色散。目前从理论和实践的角度研究AB5型稀土元素(REE)-镍化合物。在这些纳米材料的制备过程中提出了特殊的挑战,可以在始终涉及高能量使用的制备过程中使用微调的参数来克服这些挑战。薄膜沉积是通过激光诱导的汽化,短脉冲和调制脉冲以及质量因数的电光调节完成的,主要在玻璃和一个SiO2衬底上。取决于沉积几何形状的线性厚度增加,每个激光猝发在1.5–2.5 nm之间。使用XRD确定薄膜的结构和相组成,并与通过类似沉积程序获得的薄膜进行比较。通过研究电导率和光学性质来确定温度和水垢依赖性的性质。使用四探针法测量电导率。观察到的膜厚高达110 nm的类似半导体的电导率可以通过电子的热激活,然后进行岛间跳跃或量子隧穿来解释,另一方面,这可以调节材料的固有金属电导率。厚度大于该值的薄膜可以认为是基本上金属的和块状的。折射率和吸收系数的光谱行为是根据使用Kramers-Krönig形式论进行处理的在宽紫外,可见,近红外和中红外(UV-VIS-NIR-MIR)域上获得的差分反射光谱数据推导出的。他们的研究导致了对允许的带间过渡的识别。描述了费米能级附近的能带中的电子行为以及表面和界面态的电子行为,并讨论了实验数据与应用于块状金属间合金的经典自由电子理论模型之间的差异,并与理论光学性质或实验相关X射线光电子能谱(XPS)来自参考文献。但是,最薄薄膜的反射率呈电介质状,符合洛伦兹-德鲁德模型。

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