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On the Hole Injection for III-Nitride Based Deep Ultraviolet Light-Emitting Diodes

机译:基于氮化物的深紫外发光二极管的空穴注入

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摘要

The hole injection is one of the bottlenecks that strongly hinder the quantum efficiency and the optical power for deep ultraviolet light-emitting diodes (DUV LEDs) with the emission wavelength smaller than 360 nm. The hole injection efficiency for DUV LEDs is co-affected by the p-type ohmic contact, the p-type hole injection layer, the p-type electron blocking layer and the multiple quantum wells. In this report, we review a large diversity of advances that are currently adopted to increase the hole injection efficiency for DUV LEDs. Moreover, by disclosing the underlying device physics, the design strategies that we can follow have also been suggested to improve the hole injection for DUV LEDs.
机译:空穴注入是严重阻碍发射波长小于360 nm的深紫外发光二极管(DUV LED)的量子效率和光功率的瓶颈之一。 DUV LED的空穴注入效率受到p型欧姆接触,p型空穴注入层,p型电子阻挡层和多量子阱的共同影响。在本报告中,我们回顾了目前为提高DUV LED的空穴注入效率而采用的许多先进技术。此外,通过公开底层器件的物理原理,我们还提出了可以遵循的设计策略来改善DUV LED的空穴注入。

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