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High-resolution study of (222 113) three-beam diffraction in Ge

机译:Ge中(222113)三束衍射的高分辨率研究

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摘要

The results of high-resolution analysis of the (222, >113) three-beam diffraction in Ge are presented. For monochromatization and angular collimation of the incident synchrotron beam a multi-crystal arrangement in a dispersive setup in both vertical and horizontal planes was used in an attempt to experimentally approach plane-wave incident conditions. Using this setup, for various azimuthal angles the polar angular curves which are very close to theoretical computer simulations for the plane monochromatic wave were measured. The effect of the strong two-beam 222 diffraction was observed for the first time with the maximum reflectivity close to 60% even though the total reflection of the incident beam into a forbidden reflection was not achieved owing to absorption. The structure factor of the 222 reflection in Ge was experimentally determined.
机译:给出了Ge中(222,> 113)三光束衍射的高分辨率分析结果。对于入射同步加速器光束的单色化和角准直,在垂直和水平平面上采用分散设置的多晶排列,试图通过实验接近平面波入射条件。使用此设置,对于各种方位角,测量了极角曲线,该极角曲线与平面单色波的理论计算机模拟非常接近。首次观察到强双光束222衍射的效果,最大反射率接近60%,即使由于吸收未能使入射光束的全反射变为禁止反射。实验确定了222中Ge反射的结构因子。

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