基于SILVACO-TCAD的热氧化工艺实验教学探讨

摘要

本文分析了TCAD技术的在实验教学中的优势，探讨其在“半导体热氧化工艺”实验教学中的应用。并以半导体热氧化工艺为例，利用TCAD技术中ATHENA工艺仿真模块，仿真验证了热氧化厚度与热氧化时间的关系。%Analyse advantage of the TCAD technology in experimental teaching, discusses its application to the teaching of “experimental semiconductor thermal oxidation process”. And taking diffuse in semiconductor thermal oxidation process for example, using the ATHENA process simulation module in TCAD technology, the simulation verified the relationship between thermal oxide thickness and thermal oxidation time.