铋铁氧薄膜制备和应用硏究进展

摘要

铋铁氧薄膜材料作为一种室温单项多铁材料,在微电子学、光电子学、磁性存储器件等领域具有广泛应用.综述了几种制备铋铁氧薄膜方法的研究进展,并重点介绍测控溅射的方法制备的铋铁氧薄膜在不同条件参数的情况下,研究进展和薄膜现阶段在应用方面的进展,并提出未来研究的方向.%As a single multiferroic material at room temperature, bismuth ferrite thin films are widely used in microelectronics, optoelectronics, magnetic memory devices and other fields. In this paper, the research progress of several methods for preparing bismuth ferrite thin films is reviewed, and the progress of bismuth ferrite thin films prepared by magnetron sputtering under different conditions and the progress in the application of thin films at present are introduced, and the future research directions are proposed.