ALD中射频阻抗匹配器的设计与研究

摘要

The design of RF impedance matching device in the atomic layer deposition (ALD) system is described. The impedance matching network was simulated with ADS. Through analyzing the load impedance characteristic before and after the plasma generating in the vacuum chamber, and combining with the simulation results, the control method of impedance matching network when the plasma produce is proposed. The experiment proves that impedance matching can be realized by this impedance matching device and the control method.%阐述原子层沉积系统(ALD)中射频阻抗匹配器的设计方案.利用ADS软件对阻抗匹配网络进行仿真,通过分析ALD真空腔室内等离子体产生前后的负载阻抗变化,结合仿真结果,提出等离子体产生过程中阻抗匹配网络的控制方法.经实验验证,该阻抗匹配器和控制方法可实现阻抗匹配.