基于凸投影算法的多相位掩模设计原理研究

摘要

根据所需光刻图形的分布，反推掩模结构的思路，提出了一种基于交替投影算法的掩模设计方法。该方法设计出的掩模为振幅和相位连续。并给出了一个设计实例和量化方法。实验结果表明该方法对复杂相移掩模的设计有效，可以减小邻近效%The idea of deducing the construction of the mask according tothe distribu tion of the desired IC patterns is put forward. A new method based on alternative projection operation to devise phaseshifting mask has been proposed. The amplitudes and phases of the devised mask are continuous. An example mask and the quantification method are given. The experiment results show that the method is effective to devise complex phase-shifting masks and the proximity effect is decreased.