首页> 中文期刊> 《材料导报》 >不同粒径单分散SiO2粒子的制备与表面改性

不同粒径单分散SiO2粒子的制备与表面改性

             

摘要

TEOS was employed to prepare SiO2 colloid particles in diameters of 290nm, 960nm, 1.3μm and 1.9 μm, respectively,by sol-gel and seed-mediated growth methods. The effect of KH570 treatment on the surface hydro-phobicity of the S1O2 colloid particles was investigated. The SiO2 colloid particles were characterized by particle size analysis, SEM and XRD, which indicate that the products are monodispersed spherical SiO2 particles. Measurements of contact angle, hydroxyl group number and lipophilic degree were also carried out to investigate the modification process, which reveal that the concentration of KH570 and modification time exert a significant effect on the hydro-phobicity of the as^modified SCh colloid particles, where the addition of acetone into the KH570 ethanol solution is more beneficial than water for the surface modification, An ethanol solution containing 1% KH570 with addition of acetone and 6-hour reflux were determined as the optimized condition for the modification of SiO2 particles. The introduction of KH570 into the sol-gel process was able to prepare hydrophobic monodispersed SiO2 particles with a diameter of 1.9μm in one step.%以正硅酸乙酯为原料,采用溶胶-凝胶法及种子生长法制备出不同粒径(290nm、960nm、1.3μm和1.9μm)的SiO2胶体颗粒,并研究了KH570对SiO2胶体颗粒表面疏水性的影响.粒度分析、扫描电镜及X射线衍射分析结果表明,产物均为球形单分散SiO2胶体颗粒;而接触角、表面羟基数和亲油化度等测试结果显示,KH570浓度和改性时间对SiO2胶体表面性质影响显著,且丙酮作为助剂改性效果比水更好,最佳条件是以丙酮为助剂,使用1%KH570回流处理6h.此外,在存在KH570时进行溶胶-凝胶过程可一步制备出直径为1.9μm的单分散SiO2疏水颗粒.

著录项

  • 来源
    《材料导报》 |2012年第20期|84-88|共5页
  • 作者

    刘文军; 罗鲲; 喻亮;

  • 作者单位

    桂林理工大学化学与生物工程学院,桂林541004;

    桂林理工大学材料科学与工程学院,有色金属及材料加工新技术教育部重点实验室,桂林541004;

    桂林理工大学材料科学与工程学院,有色金属及材料加工新技术教育部重点实验室,桂林541004;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 磁性材料;
  • 关键词

    SiO2胶体; 粒径; KH570; 表面改性;

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