MoS2/Ni复合膜的微结构与摩擦学性能

摘要

采用磁控溅射法,在20CrMnTi基片上制备了MoS2/Ni复合膜,通过X射线衍射仪、能谱仪、扫描电子显微镜和微摩擦磨损试验机对薄膜的形貌、物相和摩擦学性能进行了测试与分析.结果表明:MoS2/Ni复合膜形貌规整,结构均匀；其摩擦因数低,具有较好的耐磨性和抗氧化性,承载能力大,在高转速摩擦条件下的性能更加优异.%MoS2/Ni composite film was prepared by magnetron sputtering method on the surface of 20CrMnTi base.Xray diffraction (XRD),X-ray energy dispersive spectroscopy (EDS) and scanning electron microscopy (SEM) were used to analyze the phase composition and microstructure of the film.The friction and wear behavior was tested with the UMT-2MT tribometer.Results reveal that the composite film was integrated and regular with a homogeneous structure.This composite film had a low fiction coefficient,a nice abrasive resistance,inoxidizability and strong carrying ability,and displayed good performance when rubbed at high rotation rate.