晶种法合成纯二氧化硅薄膜及其性质研究

摘要

晶种法在硅晶片表面生成超薄膜的的一项新兴技术.本实验中主要采取以下两个步骤:首先在浸过标准清洗的硅晶片表面吸附一层不连续的晶种,然后在培养溶液中使得二氧化硅晶体定向从而生成连续的薄膜.对于生产的产物使用XRD、SEM和FT-IR进行表征.%A seeding technique for synthesizing ultra thin films on silicon wafer has been developed. The technique consists of two steps.A monolayer of discrete colloidal zeolite seed crystals is adsorbed on the substrate, where after the crystals are allowed to grow into a continuous film in a precursor solution. The films are characterized by XRD, SEM and FT-IR.