薄膜厚度对Ni-Zn铁氧体薄膜性能的影响

摘要

Ni0.5Zn0.5Fe2O4 ferrite films were deposited on Si (100) substrate by using RF magnetron sputtering technique. The influence of film thickness on the microstructure and magnetic property of the films were investigated. The results showed that diffusion occurs between Si substrate and Ni-Zn ferrite film when the films are annealed in air at 800℃. Both lattice parameter and grain size of Ni0.5Zn0.5Fe2O4 ferrite films increase with increasing film thickness. Meantime, the saturation magnetization Ms and coercivity Hc increase slightly with the increase of film thickness.%采用射频磁控溅射法在Si(100)基片上沉积Ni0.5Zn0.5Fe2O4铁氧体薄膜,研究了薄膜厚度对其结构和性能的影响.结果表明,在800℃空气中退火时,Si基片与Ni-Zn铁氧体薄膜存在相互渗透.随薄膜厚度增加,薄膜样品晶格常数及晶粒尺寸增大,饱和磁化强度Ms和矫顽力Hc均略有增加.