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MANUFACTURING METHOD OF NI-ZN FERRITE THIN FILM

机译:Ni-ZN铁氧体薄膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a ferrite thin film which can form a thin film of a desired thickness efficiently by a simple device without sacrificing the good soft magnetism of ferrite, thereby greatly improve reduction in the size and weight of an electronic apparatus.;SOLUTION: The manufacturing method of the ferrite thin film adopts Spray Pyrolysis Deposition in which a raw mixture solution containing a nitride of metal composing ferrite is sprayed intermittently from a discharge nozzle to a heated substrate using a carrier gas. The temperature of a substrate is 300-500 °C, preferably, 350-450 °C. The nitride of the metal is comprised of Fe(NO3)3, Zn(NO3)2, and Ni(NO3)2. The nitride of the metal is blended so that an ion concentration ratio a:b:c of (Fe)2, Zn and Ni in the ferrite thin film is 0.30≤a≤0.70, 0.14≤b≤0.45, 0.08≤c≤0.38 (where a+b+c=1). The mixture solution is sprayed intermittently from the discharge nozzle by using compressed air as the carrier gas.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种铁氧体薄膜的制造方法,该方法可以通过简单的装置有效地形成期望厚度的薄膜,而不会牺牲铁氧体的良好的软磁性,从而大大改善了铁氧体薄膜的尺寸和重量的减小。解决方案:铁氧体薄膜的制造方法采用喷涂热解沉积法,其中使用载气从排料喷嘴向加热的基板间歇性地喷涂含有组成铁氧体的金属的氮化物的原始混合溶液。基板的温度为300-500℃,优选为350-450℃。金属的氮化物由Fe(NO 3 3 ,Zn(NO 3 2 ,和Ni(NO 3 2 。混合金属的氮化物,以使铁素体薄膜中的(Fe) 2 ,Zn和Ni的离子浓度比a:b:c为0.30le; a≤ 0.70,0.14≤。 b≤ 0.45、0.08≤ c≤ 0.38(其中a + b + c = 1)。使用压缩空气作为载气,从排液喷嘴间歇性地喷射混合溶液。版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005223363A

    专利类型

  • 公开/公告日2005-08-18

    原文格式PDF

  • 申请/专利权人 MINEBEA CO LTD;

    申请/专利号JP20050126664

  • 发明设计人 TAKAYAMA AKIO;KANEKO MASAHARU;

    申请日2005-04-25

  • 分类号H01F41/24;H01F10/20;

  • 国家 JP

  • 入库时间 2022-08-21 22:35:48

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