采用水热辅助表面接枝印迹技术,以Cd（Ⅱ）离子作为模板,巯基丙基三甲氧基硅烷为功能分子,环氧氯丙烷为交联剂,在硅胶表面制备出高容量的Cd（Ⅱ）离子印迹硅胶材料,利用红外光谱仪、扫描电镜、热重分析仪等进行了表征,采用平衡吸附法研究了印迹硅胶材料的吸附性能和选择识别能力。结果表明,印迹硅胶材料和非印迹硅胶材料的最大吸附量分别为42.5和22.1mg/g;印迹硅胶材料对Cd（Ⅱ）离子具有较强的选择识别能力,对Cd（Ⅱ）离子的吸附行为更符合Langmuir模型,20min即可达到吸附平衡,符合准二级动力学方程,pH值在4～8范围内,保持了较好的吸附容量;重复使用时性能较好。%Cd（ Ⅱ ）-imprinted silica was prepared by hydrothermal-assisted surface imprinting technique using Cd （ Ⅱ ） as the template, with （3-mercaptopropyl） trimethoxysilane functionalized the surface of silica as a potential sorbent for the selective adsorption Cd（ Ⅱ ）, and characterized by FT-IR, SEM and TGA-DTA. The adsorption property and selective recognition ability of Cd（ Ⅱ ）-imprinted silica were studied by equilibrium-ad- sorption method. The results showed that the maximum static adsorption capacities of imprinted and non-imprinted silica were 42.5 and 22. lmg/g, respectively. The experimental data followed the Langmuir adsorption model. The adsorption equilibrium could be reached in 20min. Kinetic studies indicated that the adsorption followed a pseudo-second-order model. There was no influence of pH values on adsorption capacity of imprinted silica in the range of 4-8. Imprinted silica could be used repeatedly and indicated high selectivity even in the presence of the other metal ions.
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