A series of FePt thin films with different thicknesses under different Ar gas pressures were prepared by DC magneton sputtering on glass substrates. The effects of sputtering pressure and film thickness on FePt microstructure were investigated by TEM. The effects of sputtering pressure and film thickness on magnetic properties were also determined by VSM. The results show that, the sputtering pressure and film thickness have great influences on morphology and grain size of as-deposited FePt thin films. With increasing the sputte- ring pressure, the grain size decreases, together with the continuous film changing into granular film. As the film thickness increases, the grain size becomes larger and the film morphology changes from granular film into continuous one. By controlling the sputtering pressure, FePt granular films with island structure have been suc- cessfully prepared. Sputtering pressure and film thickness have great effects on magnetic properties of annealed FePt thin films. As for annealed film, with the increase of sputtering pressure, the nucleation field changes from the positive into the negative, together with an increase in the squareness ratio of magnetic loop. With the increase of film thickness, disorder-order transition of the FePt thin films become more complete.%利用磁控溅射在不同Ar气压下制备了不同膜厚的FePt薄膜。利用透射电镜（TEM）研究了溅射气压和膜厚对薄膜形貌的影响，利用振动样品磁强计（VSM）研究了溅射气压和膜厚对薄膜磁性能的影响。结果表明溅射气压和膜厚对溅射态单层FePt薄膜的表面形貌、颗粒尺寸有很大影响。随着溅射气压的增大，颗粒尺寸减小，从连续膜转变成颗粒膜；随着膜厚的增加，颗粒尺寸变大，从颗粒膜变成连续膜。通过调节溅射气压可以控制FePt的岛状结构，从而获得较理想的FePt颗粒薄膜。溅射气压和膜厚对经过热处理的L10-FePt薄膜的磁性能有很大影响。随着溅射气压增加，形核场由正值转变成负值，矩形比有增大趋势；随着厚度的增加，无序-有序相转变更充分。
展开▼
