精密高压稳压电源的研究与设计

摘要

介绍了用于新型电子束曝光机的30 kV精密高压稳压电源。该电源系统采用了直接调整和间接调整相结合的双闭环调整方案,采用了集中补偿和分散补偿相结合的系统补偿方式,成功地解决了既有高静态精度又有高动态稳定性的问题。为了保证高精度、高稳定性和低纹波电压等技术指标的实现,采取了多项合理的特定电路设计。针对电源系统输出直流高压这一特点,对关键技术采取了针对性的切实有效的技术处理,从而满足了高压电源的高可靠性和长期高稳定性的性能要求。各项技术指标均达到或超过原设计要求。%This paper recommends a high precision regulated power supply with 30 kV high voltage.The regulated power supply provides for a new type electron beam lithograph system.This power supply system adopts design scheme of double closed loop regulation and design scheme of centvalized compensation combined with dispersed compensation.It has successfully resoved the problem of the high static accuracy and the high dynamic stability.In order to ensure high stability and low ripple voltage to achieve,this regulated power supply takes on some reasonable and specific ciruit design items.In accordance with the technical requirments of the high voltage regulated power supply,some key techniques of high voltage have been properly handle.All its performance indexes satisfy or exceed the original desigh requirements.