化学腐蚀硅表面结构反射率影响因素的研究

摘要

We studied the process of monocrystalline silicon corrosion and reflectivity,which measured by UV-visible spectrophotometer.The density of alkaline,the corrosion time,the different types of additives,and the additive concentration have been considered.As a result,to obtain lower reflectivity,the concentration of a solution of alkali and corrosion time play a decisive role.The low average reflectivity,good repeatability and ideal reducing corrosion fluid can be obtained.In the condition that at 80 ℃,the concentration of NaOH is 15 g/L,Anhydrous ethanol volume fraction of 10% and the corrosion time is 30 min,the surface reflectivity of 11.15% on silicon can be obtained.%单晶硅片在碱溶液中的腐蚀会引起表面结构的变化,利用紫外可见分光光度计测量硅片表面反射率,发现碱溶液的浓度、腐蚀时间、添加剂的选择(无水乙醇或异丙醇)以及添加剂的浓度均对硅片表面反射率有影响.比较几个因素发现碱溶液的浓度和腐蚀时间对硅片表面反射率影响最大.当腐蚀温度为80 ℃,NaOH固体浓度为15 g/L,添加剂无水乙醇体积分数10%时,腐蚀30 min得到硅片反射率最低,达到11.15%.