中子应力谱仪双聚焦 Si 单色器设计、模拟与测试

摘要

The double focusing Si monochromator was designed ,simulated and tested for the neutron residual stress diffractometer on China Advanced Research Reactor .T he optimal vertical curvature and the optimal thickness of Si wafers were obtained by SIMRES simulation program .In addition ,the figure of merit in dependence on the scattering angle ,monochromator horizontal curvature and wavelength was also deter‐mined by this program . The neutron beam test results indicate that the intensity of neutron increases by 15 times by using double focusing Si monochromator in comparison with Cu monochromator .%本文对中国先进研究堆中子应力谱仪使用的双聚焦 Si单色器进行了设计、模拟和测试。采用SIM RES模拟程序确定了单色器垂直曲率及Si片厚度的最优值，并得到品质因数与散射角、单色器水平曲率和波长的依赖关系。实际测试结果表明，与平板Cu单色器相比，使用双聚焦Si单色器样品处中子强度提高了15倍。