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序批式光合细菌产氢过程中底物的消耗特征

         

摘要

以葡萄糖和蛋白胨为底物,采用光合细菌PSB-ZF1进行了序批式产氢实验.通过对静态产氢底物的分析,研究了细菌的生长及产气过程中底物与产物的变化规律.结果表明,光合细菌对数生长期在接种12 h后出现,氢的产生与PSB-ZF1的生长是偶联的,最大产氢量为475 mL/L底物.底物中TOC、TN含量随时间呈逐渐下降趋势,产氢末期底物中TOC和TN浓度分别降至初始浓度的27.6%和33.8%.而IC浓度和pH值呈先下降后升高趋势,120 h时pH值达到最低值5.7.在底物中检测到甲酸、乙酸、丁酸和戊酸等4种低分子有机酸,未检测到丙酸.产氢初始阶段,底物中的甲酸、乙酸、丁酸浓度变化不大,光合细菌代谢产戊酸而不产丙酸,戊酸浓度在96 h达到最大值3.013 mmol/L.产气末期戊酸和丁酸被细菌代谢消耗掉,甲酸浓度上升至2.813 mmol/L,整个产气过程,乙酸的浓度维持在1.10~1.83 mmol/L之间.%Sequencing batch hydrogen production experiments were conducted using photosynthetic bacteria PSB-ZF1 ,with glucose and peptone as the substrate .Based on the analysis of static hydrogen production substrate ,the changes of substrate and product during bacterial growth and gas production were studied.The results showed that the logarithmic growth phase of photosynthetic bacteria appeared after inoculation with 12 h,and the hydrogen production was coupled with the growth of PSB-ZF1 ,and the maximum hydrogen production was 475 mL/L substrate .The content of TOC and TN in the substrate decreased gradually with time.At the end of hydrogen production ,the concentrations of TOC and TN decreased to 27.6%and 33.8%of the initial concentration respectively .The IC concentration and pH value decreased first and then increased .The pH value reaches a minimum value of 5.7 at 120 h.Except for propionic acid,four kinds of low molecular organic acids of formic acid ,acetic acid,butyric acid and valeric acid were detected in the substrate ,and the concentrations of formic acid ,acetic acid and butyric acid in the initial stage of hydrogen production were little changed .Photosynthetic bacteria produce valeric acid with-out propionic acid,maximum value of 3.013 mmol/L at 96 h.At the end of the gas production,valeric acid and butyric acid was not detected ,but formic acid rose to 2.813 mmol/L.The concentration of acetic acid maintained 1.10~1.83 mmol/L throughout the process of gas production .

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