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Influence of water on the photocatalytic properties of synthetic nanocrystalline iron oxide films.

机译:水对合成纳米晶氧化铁薄膜光催化性能的影响。

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摘要

Two sets of synthetic nanocrystalline iron oxide films were grown via Atmospheric Pressure Chemical Vapor Deposition (AP CVD) under identical conditions, barring the exclusion or inclusion of water vapor within the depositional environment. The morphology and electrochemical properties of the resulting films were examined and compared.;The presence of water during AP CVD deposition of nanocrystalline silicon doped hematite films impacts the photocatalytic properties of the resulting films. This is likely due to the inhibition of optimal doping of Fe2 O3 by the presence of water during growth. The presence of an amorphous iron phase in the wet preparation films, likely am-FeOOH, was suggested by Raman analysis, and is a possible source of lowered photocurrents in these films.;Wet preparation films were found to have a bandgap of 1.96 eV and an estimated film thickness of 214 nm; dry preparation films have a bandgap of 1.9 eV and an estimated film thickness of 412 nm thick. Irrespective of preparation method, the fundamental particle size had an average diameter of about 20 nm. Mott-Schottky analysis was used for donor density calculations; dry preparation films had a donor density of about 8.9*1018 cm-3 and wet films had a donor density of about 5.5*1016 cm -3. The differences in donor levels result in a significance difference in depletion layer width, which in turn may be responsible for lowered photocurrents in wet preparation films relative to dry preparation films.;Cyclic voltammetry indicates that at low applied potentials, loss of efficiency is dominated by intragap state recombination in both preparation methods, but at higher applied potentials, loss of efficiency in dry preparation films is dominated by reduction of radicals in solution by photogenerated electrons, and by intragap state recombination in wet preparation films. Evidence suggests that the intragap state is never fully emptied in the wet preparation films and thus optimum photocurrents are never achieved. The single slope seen in the Mott-Schottky analysis supports this assertion.
机译:通过在相同条件下通过大气压化学气相沉积(AP CVD)生长两组合成的纳米氧化铁薄膜,除非在沉积环境中排除或包含水蒸气。检查并比较了所得膜的形貌和电化学性能。;在AP CVD掺杂纳米晶硅掺杂赤铁矿膜的过程中水的存在影响了所得膜的光催化性能。这可能是由于在生长过程中水的存在抑制了Fe2 O3的最佳掺杂。拉曼分析表明,湿法制备薄膜中存在非晶态铁相,可能是am-FeOOH,这可能是这些薄膜中光电流降低的原因;湿法制备薄膜的带隙为1.96 eV,估计的薄膜厚度为214 nm;干制备膜的带隙为1.9 eV,估计膜厚度为412 nm。与制备方法无关,基本粒径的平均直径为约20nm。使用Mott-Schottky分析进行供体密度计算。干制备膜的供体密度为约8.9×1018cm-3,湿膜的供体密度为约5.5×1016cm -3。供体水平的差异导致耗尽层宽度的显着差异,这又可能导致湿法制备薄膜相对于干法制备薄膜的光电流降低。循环伏安法表明,在低施加电势下,效率损失主要由两种制备方法中的间隙内状态重组,但是在较高的施加电势下,干法制备膜中效率的损失主要是由光生电子减少溶液中的自由基,以及湿法制备膜中的间隙内状态复合所致。有证据表明,湿制备膜中的间隙状态从未完全排空,因此从未获得最佳的光电流。在Mott-Schottky分析中看到的单个斜率支持这一主张。

著录项

  • 作者单位

    University of Wyoming.;

  • 授予单位 University of Wyoming.;
  • 学科 Geochemistry.
  • 学位 M.S.
  • 年度 2008
  • 页码 87 p.
  • 总页数 87
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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