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Fabrication of surface micro- and nanostructures for superhydrophobic surfaces in electric and electronic applications.

机译:用于电气和电子应用的超疏水表面的表面微结构和纳米结构的制造。

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In our study, the superhydrophobic surface based on biomimetic lotus leave is explored to maintain the desired properties for self-cleaning. Parameters in controlling bead-up and roll-off characteristics of water droplets were investigated on different model surfaces. The governing equations were proposed. Heuristic study is performed. First, the fundamental understanding of the effect of roughness on superhydrophobicity is performed. The effect of hierarchical roughness, i.e., two scale roughness effect on roughness is investigated using systems of (1) monodisperse colloidal silica sphere (submicron) arrays and Au nanoparticle on top and (2) Si micrometer pyramids and Si nanostructures on top from KOH etching and metal assisted etching of Si. The relation between the contact area fraction and water droplet contact angles are derived based on Wenzel and Cassie-Baxter equation for the systems and the two scale effect is explained regarding the synergistic combination of two scales.;Previously the microscopic three-phase-contact line is thought to be the key factor in determining contact angles and hystereses. In our study, Laplace pressure was brought up and related to the three-phase-contact line and taken as a key figure of merit in determining superhydrophobicity. In addition, we are one of the first to study the effect of tapered structures (wall inclination). Combining with a second scale roughness on the tapered structures, stable Cassie state for both water and low surface energy oil may be achieved. This is of great significance for designing both superhydrophobicity and superoleophobicity.;Regarding the origin of contact angle hysteresis, study of superhydrophobicity on micrometer Si pillars was performed. The relation between the interface work of function and contact angle hysteresis was proposed and derived mathematically based on the Young-Dupre equation. The three-phase-contact line was further related to a secondary scale roughness induced.;Based on our understanding of the roughness effect on superhydrophobicity (both contact angle and hysteresis), structured surfaces from polybutadiene, polyurethane, silica, and Si etc. were successfully prepared. For engineering applications of superhydrophobic surfaces, stability issues regarding UV, mechanical robustness and humid environment need to be investigated. Among these factors, UV stability is the first one to be studied. However, most polymer surfaces we prepared failed the purpose. Silica surfaces with excellent UV stability were prepared. This method consists of preparation of rough silica surfaces, thermal treatment and the following surface hydrophobization by fluoroalkyl silane treatment. Fluoroalkyl groups are UV stable and the underlying species are silica which is also UV stable (UV transparent). UV stability on the surface currently is 5,500 h according the standard test method of ASTM D 4329. No degradation on surface superhydrophobicity was observed. New methods for preparing superhydrophobic and transparent silica surfaces were investigated using urea-choline chloride eutectic liquid to generate fine roughness and reduce the cost for preparation of surface structures.;Another possible application for self-cleaning in photovoltaic panels was investigated on Si surfaces by construction of the two-scale rough structures followed by fluoroalkyl silane treatment. Metal (Au) assisted etching was employed to fabricate nanostructures on micrometer pyramid surfaces. The light reflection on the prepared surfaces was investigated. After surface texturing using KOH etching for micrometer pyramids and the following nanostructure using metal assisted etching, surface light reflection reduced to a minimum value which shows that this surface texturing technique is highly promising for improving the photovoltaic efficiency while imparting photovoltaics the self-cleaning feature. This surface is also expected to be UV stable due to the same fluoroalkyl silane used.;Regarding the mechanical robustness, epoxy-silica superhydrophobic surfaces were prepared by O2 plasma etching to generate enough surface roughness of silica spheres followed by fluoroalkyl silane treatment. A robustness test method was proposed and the test results showed that the surface is among the most robust surfaces for the superhydrophobic surfaces we prepared and currently reported in literature.
机译:在我们的研究中,探索了基于仿生荷叶的超疏水表面,以保持所需的自我清洁性能。研究了在不同模型表面上控制水滴的成珠和滚降特性的参数。提出了控制方程。进行启发式研究。首先,进行了对粗糙度对超疏水性影响的基本理解。使用(1)单分散胶体二氧化硅球(亚微米)阵列和顶部的Au纳米粒子,以及(2)通过KOH蚀刻的顶部的Si微米金字塔和Si纳米结构的系统研究了分层粗糙度(即,两个尺度的粗糙度对粗糙度的影响)的影响。和金属辅助的硅腐蚀。根据系统的Wenzel和Cassie-Baxter方程推导了接触面积分数与水滴接触角之间的关系,并解释了两个尺度的协同组合的两个尺度效应。被认为是确定接触角和磁滞的关键因素。在我们的研究中,拉普拉斯压力上升并与三相接触线有关,并被视为确定超疏水性的​​关键指标。此外,我们是最早研究锥形结构(壁倾角)影响的公司之一。结合锥形结构上的第二刻度粗糙度,可以实现水和低表面能油的稳定卡西状态。这对于设计超疏水性和超疏油性都具有重要意义。关于接触角磁滞的起源,对微米级Si柱上的超疏水性进行了研究。提出了函数界面功与接触角滞后之间的关系,并基于Young-Dupre方程进行了数学推导。三相接触线还与引起的二次氧化皮粗糙度有关。根据我们对粗糙度对超疏水性的​​影响(接触角和滞后性),我们发现聚丁二烯,聚氨酯,二氧化硅和硅等的结构化表面准备成功。对于超疏水表面的工程应用,需要研究有关紫外线,机械强度和潮湿环境的稳定性问题。在这些因素中,紫外线稳定性是第一个要研究的因素。但是,我们制备的大多数聚合物表面均达不到目的。制备具有优异的紫外线稳定性的二氧化硅表面。该方法包括制备粗糙的二氧化硅表面,热处理和随后的通过氟代烷基硅烷处理的表面疏水化。氟烷基是紫外线稳定的,下面的物质是二氧化硅,它也是紫外线稳定的(紫外线透明)。根据ASTM D 4329的标准测试方法,目前表面的紫外线稳定性为5500小时。未观察到表面超疏水性的​​降低。研究了使用尿素-氯化胆碱共晶液制备超疏水和透明二氧化硅表面的新方法,以产生精细的粗糙度并降低制备表面结构的成本。;研究了通过构造在硅表面上进行光伏自清洁的另一种可能的应用的两级粗糙结构,然后进行氟烷基硅烷处理。采用金属(Au)辅助蚀刻在微米棱锥表面上制造纳米结构。研究了在准备好的表面上的光反射。在使用用于微米级金字塔的KOH蚀刻进行表面纹理处理以及随后使用金属辅助蚀刻的纳米结构之后,表面光反射减小到最小值,这表明这种表面纹理化技术对于提高光伏效率同时赋予光伏材料自清洁功能极有希望。由于使用了相同的氟代烷基硅烷,该表面也有望具有紫外线稳定性。关于机械强度,通过O2等离子体蚀刻制备环氧-二氧化硅超疏水表面,以产生足够的二氧化硅球表面粗糙度,然后进行氟代烷基硅烷处理。提出了一种坚固性测试方法,测试结果表明该表面是我们制备的超疏水性表面中最坚固的表面之一,目前在文献中已有报道。

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