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Development of 4H silicon carbide JFET-based power integrated circuits.

机译:基于4H碳化硅JFET的功率集成电路的开发。

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摘要

4H-Silicon Carbide (4H-SiC) is a promising semiconductor for the next generation of high power, high frequency, and high temperature applications. Significant progresses have been made on SiC technologies since 1990's. Superior device performance demonstrated by SiC discrete power devices is leading to the commercialization of SiC diodes and transistors targeting mid and high power level applications. As compared to the vertical power devices, the lateral device technology promises to fulfill the monolithic integration of both power devices and control circuits. SiC power integrated circuits (PICs) share similar advantages as Si PICs while providing a much higher power handling capability at higher frequency. In addition, SiC power junction field transistor (JFET) is promising for high temperature, reliable operation without suffering from the reliability problems faced by metal-oxide-semiconductor junction field transistors (MOSFETs) and bipolar junction transistors (BJTs). Therefore, the lateral JFET technology is investigated under this research.;This thesis describes design, fabrication, characterization, and further optimization and analysis of a novel vertical channel lateral JFET (VC-LJFET) technology in 4H-SiC and the demonstration of the world's first SiC power Integrated circuit. A double reduced surface electric field (RESURF) structure is applied to achieve higher voltage and lower on-resistance for the power lateral JFET (LJFET). A 4-stage buffer circuit based on the resistive-load n-type JFET inverter is designed and integrated with the power LJFET to form a monolithic power integrated circuit. Important fabrication procedures are presented. The fabricated power LJFET demonstrates a blocking voltage of 1028 V and a specific on-resistance of 9.1 mO·cm2, resulting in a record-high VBR2/RON,SP figure-of-merit (FOM) of 116 MW/cm2 for lateral power devices. The optimized RESURF structure demonstrates blocking capability of 120 V/im in 4H-SiC. The temperature dependences of important device parameters, such as threshold voltage, transconductance, and electron mobility, are also discussed. Based on the technology, the integration of a high performance lateral power JFET with buffer circuits has been demonstrated for the first time. The SiC LJFET power IC chips demonstrate a record high power level at frequencies up to a few MHz. An on-chip temperature sensing diode is implemented to monitor the chip junction temperature. The rise time and fall time around 20 ns for the SiC power LJFET are observed and remains unchanged even at a junction temperature as high as 250°C when driven by a Si MOS gate driver. The demonstration of SiC power integration technology points to the robust integrated power electronics applications in the harsh environment and boosts the power level of single-chip power electronic system from 100 W to 1000 W.
机译:4H碳化硅(4H-SiC)是用于下一代高功率,高频和高温应用的有前途的半导体。自1990年代以来,SiC技术已取得重大进展。 SiC分立功率器件所展示的卓越器件性能正导致针对中功率和高功率应用的SiC二极管和晶体管的商业化。与垂直功率设备相比,横向设备技术有望实现功率设备和控制电路的单片集成。 SiC电源集成电路(PIC)具有与Si PIC相似的优势,同时在更高的频率下提供了更高的功率处理能力。此外,SiC功率结场效应晶体管(JFET)有望在高温下可靠运行,而不会遭受金属氧化物半导体结场效应晶体管(MOSFET)和双极结晶体管(BJT)所面临的可靠性问题。因此,本研究对横向JFET技术进行了研究。本文描述了一种新颖的4H-SiC垂直沟道横向JFET(VC-LJFET)技术的设计,制造,表征以及进一步的优化和分析,以及世界范围内的演示。首款SiC功率集成电路。应用双重减小的表面电场(RESURF)结构以实现功率横向JFET(LJFET)的更高电压和更低导通电阻。设计了一个基于电阻负载n型JFET反相器的4级缓冲电路,并将其与电源LJFET集成在一起,以形成单片电源集成电路。介绍了重要的制造程序。所制造的功率LJFET的阻断电压为1028 V,比导通电阻为9.1 mO·cm2,因此,横向功率的VBR2 / RON,SP品质因数(FOM)达到了创纪录的116 MW / cm2设备。优化的RESURF结构展示了在4H-SiC中120 V / im的阻断能力。还讨论了重要器件参数(例如阈值电压,跨导和电子迁移率)的温度依赖性。基于该技术,首次展示了高性能横向功率JFET与缓冲电路的集成。 SiC LJFET功率IC芯片在高达几MHz的频率下显示出创纪录的高功率水平。片上温度感测二极管用于监视芯片结温。观察到SiC功率LJFET的上升时间和下降时间大约为20 ns,即使在由Si MOS栅极驱动器驱动的结温高达250°C的情况下也保持不变。 SiC功率集成技术的演示指出了在恶劣环境中强大的集成功率电子应用,并将单芯片功率电子系统的功率水平从100 W提高到1000W。

著录项

  • 作者

    Zhang, Yongxi.;

  • 作者单位

    Rutgers The State University of New Jersey - New Brunswick.;

  • 授予单位 Rutgers The State University of New Jersey - New Brunswick.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 148 p.
  • 总页数 148
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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