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Silica precipitation from analcime dissolution.

机译:二氧化硅从止垢剂中沉淀出来。

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Pure monosilicic acid solutions mimic the precipitation of silica dissolved from analcime in HCl. Thus, mineral dissolution and silica precipitation are decoupled and pure monosilicic acid solutions were used to study the precipitation of silicon dissolved from minerals.;Monosilicic acid solutions were used to study silicon precipitation using UV-Vis and DLS. UV-Vis results showed that under very acidic conditions monosilicic acid disappears rapidly from solution and follows second-order disappearance kinetics. Then, from DLS, it is shown that within the first few minutes, monosilicic acid polymerized to form primary particles ∼5nm in diameter, which then flocculate, with mean floc diameter increasing exponentially with time. Both the monomer disappearance and flocculation rate increase with increasing HCl concentration.;The flocculation was computer-simulated using a Smoluchowski equation modified for a geometric population balance with a reaction-limited aggregation (RLA) kernel. DLS-measured mean silica particle size agreed well with the simulated mean particle sizes.;Salt experiments indicate that 1M salt added to HCl can increase monosilicic acid disappearance rate and silica particle growth rate in the order: AlCl3CaCl2MgCl2 NaClCsClnosalt. UV-Vis results showed that monosilicic acid disappears rapidly and follows a third-order kinetic rate law in contrast to second-order when no salt is present. DLS results showed that silica particle size also increases exponentially with time when salt is present. It was also found that specific reaction rate constants: monosilicic acid disappearance rate constant, particle growth rate constant and computer-simulation aggregation rate constant, increase exponentially for all salts as a function of solution ionic strength.;Finally, initial dissolution rate of analcime in the strong acids HCl, HBr, and HNO3 are very similar and follow a Michaelis-Menten mechanism. At proton concentrations less than 0.055M, initial dissolution rate in citric acid was faster than initial dissolution rate in the strong acids.;The observed plateau in AAS/ICP-MS silicon concentration during analcime dissolution exists because of a recondensation reaction between silanol groups within dissolving analcime. The recondensation rate varies in strong acids corresponding to the order: H2SO4HIHBrHClHN O3
机译:纯的单硅酸溶液模拟了从Analcime溶于HCl的二氧化硅沉淀。因此,将矿物溶解与二氧化硅沉淀解耦,并使用纯单硅酸溶液研究从矿物中溶解的硅的沉淀。单硅酸溶液用于使用UV-Vis和DLS研究硅沉淀。 UV-Vis结果表明,在非常酸性的条件下,单硅酸会从溶液中迅速消失,并遵循二级消失动力学。然后,从DLS中可以看出,在最初的几分钟内,单硅酸聚合形成直径约5nm的初级颗粒,然后絮凝,平均絮凝直径随时间呈指数增长。单体的消失和絮凝速率都随着HCl浓度的增加而增加。絮凝是使用Smoluchowski方程计算机模拟的,该方程针对具有反应受限聚集(RLA)核的几何种群平衡进行了修改。 DLS测量的平均二氧化硅粒径与模拟的平均粒径非常吻合。盐实验表明,向HCl中添加1M盐可以按以下顺序增加单硅酸消失率和二氧化硅粒子生长速率:AlCl3> CaCl2> MgCl2> NaCl> CsCl >诺萨尔UV-Vis结果表明,单硅酸迅速消失,并且遵循三阶动力学速率定律,与不存在盐时的二阶动力学定律相反。 DLS结果表明,当存在盐时,二氧化硅的粒径也随时间呈指数增长。还发现特定的反应速率常数:单硅酸消失速率常数,颗粒生长速率常数和计算机模拟聚集速率常数,对于所有盐而言,其呈指数增加,是溶液离子强度的函数。强酸HCl,HBr和HNO3非常相似,并遵循Michaelis-Menten机制。在质子浓度小于0.055M时,柠檬酸中的初始溶解速率要快于强酸中的初始溶解速率。;在Ananime溶解过程中,观察到的AAS / ICP-MS硅浓度存在平台期,这是因为内部的硅烷醇基团之间发生了再缩合反应溶解analcime。在强酸中,缩合速率随以下顺序变化:H2SO4> HI> HBr> HCl> HN O3

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