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Investigations of surface reconstructions and inverse Stranski Krastanov growth in indium gallium arsenide films.

机译:砷化铟镓薄膜的表面重建和Stranski Krastanov逆生长的研究。

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摘要

Understanding surface reconstructions is an important aspect of controlling the structure of epitaxially grown III-V compound semiconductors. Ternary alloys such as InxGa1-xAs are important components of many electronic and optical devices and a parameter that is critical to the growth of these high quality devices is the presence of abrupt heterointerfaces.;As the final microstructures impact the performance of optoelectronic devices, it is important to understand why and under what conditions the reconstructions that initiate these structures form. Understanding the conditions under which these reconstruction domains form, and controlling their shape and size could provide another reliable method of forming spontaneous nanoscale assemblies.;The ultimate goal of my research is to develop a quantitative understanding of the connection between surface reconstructions on In0.81Ga 0.19As/InP and film thickness, surface energy, growth conditions, and surface morphology. The individual objectives of this work are to: (1) Understand under which conditions multiple surface reconstructions coexist and the role of thermodynamics. (2) Examine how growth conditions and material properties influence the surface reconstructions that appear for In0.81Ga 0.19As ternary alloys. (3) Look at the relationship between surface reconstructions and film morphology.;The combination of scanning tunneling microscopy (STM) and molecular beam epitaxy (MBE) growth is a necessary component of this research because the experimentation tools available on the MBE system allows for the examination of the surface structure during and after growth via reflection high energy electron diffraction (RHEED). The availability of an in vacuo STM allows the observation of the surface reconstructions prior to the formation of an oxide layer. Combining these two techniques allows for a better understanding between the growth procedure of the sample and the presence of surface reconstructions.
机译:了解表面重构是控制外延生长的III-V化合物半导体结构的重要方面。三元合金(例如InxGa1-xAs)是许多电子和光学设备的重要组成部分,而突然出现的异质界面对于这些高质量设备的生长至关重要的参数;由于最终的微结构会影响光电设备的性能,因此了解为什么以及在什么条件下启动这些结构的重建很重要。了解这些重构域的形成条件并控制其形状和大小可以提供另一种可靠的自发形成纳米级组装体的方法。我研究的最终目标是对In0.81Ga上的表面重构之间的联系进行定量理解0.19As / InP以及膜厚度,表面能,生长条件和表面形态。这项工作的个人目标是:(1)了解在哪些条件下多个表面重构共存以及热力学的作用。 (2)检查生长条件和材料特性如何影响In0.81Ga 0.19As三元合金的表面重构。 (3)研究表面重建与薄膜形态之间的关系。扫描隧道显微镜(STM)和分子束外延(MBE)生长的结合是这项研究的必要组成部分,因为MBE系统上可用的实验工具可以通过反射高能电子衍射(RHEED)检查生长过程中和生长后的表面结构。真空STM的可用性允许在形成氧化物层之前观察表面重构。结合这两种技术可以更好地理解样品的生长过程和表面重建的存在。

著录项

  • 作者

    Sears, Lee E.;

  • 作者单位

    University of Michigan.;

  • 授予单位 University of Michigan.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 153 p.
  • 总页数 153
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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