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Estimation of complex permittivity of silicon at 2.45 ghz microwave frequency.

机译:在2.45 GHz微波频率下估算硅的复介电常数。

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摘要

Estimation of complex permittivity of arsenic-doped silicon is the primary topic of discussion in this thesis presentation. The frequency that is of interest is 2.45 GHz, frequency typically used in conventional microwave ovens. The analysis is based on closed-form analytical expressions of cylindrical symmetry. A coaxial/radial line junction with the central conductor sheathed in dielectric material, which is As-doped silicon in this case, are analyzed. Electrical and magnetic field equations governing the wave propagation in this setup are formulated by applying the necessary boundary conditions. Input admittance is computed using the fields in the device and reflection coefficient is calculated at the input. This analytical solution is matched to the reflection coefficient acquired by experiments conducted, using VNA as the input source. The contemplation is backed by simulation using High Frequency Structural Simulator, HFSS. Susceptor-assisted microwave heating has been shown to be a faster and easier method of annealing arsenic-doped silicon samples. In that study, it was noticed that the microwave power absorbed by the sample can directly be linked to the heat power required for the annealing process. It probes the validity of the statement that for arsenic-doped silicon the heating curve depends only on its sheet properties and not on the bulk as such and the results presented here gives more insight to it as to why this assumption is true. The results obtained here can be accepted as accurate since it is known that this material is highly conductive and electromagnetic waves do not penetrate in to the material beyond a certain depth, which is given by the skin depth of the material. Hall measurements and four-point-probe measurements are performed on the material in support of the above contemplation.
机译:砷掺杂硅的复介电常数的估计是本文的主要讨论主题。感兴趣的频率是2.45 GHz,这是常规微波炉中通常使用的频率。该分析基于圆柱对称的闭合形式分析表达式。分析了同轴/径向线结,其中心导体包覆在介电材料中,在这种情况下为掺杂硅。通过应用必要的边界条件,可以确定控制此设置中波传播的电场和磁场方程。使用设备中的字段计算输入导纳,并在输入处计算反射系数。该分析解决方案与使用VNA作为输入源进行的实验获得的反射系数匹配。通过使用高频结构仿真器HFSS进行的仿真来支持这一思考。基座辅助微波加热已被证明是一种更快,更容易地对掺砷硅样品进行退火的方法。在该研究中,我们注意到样品吸收的微波功率可以直接与退火过程所需的热功率联系起来。它探究了以下说法的正确性:对于掺砷的硅,加热曲线仅取决于其片材性能,而不取决于其本身的体积,此处给出的结果使人们更加了解为什么这种假设是正确的。在此获得的结果可以被认为是准确的,因为已知该材料具有很高的导电性,并且电磁波不会穿透到超过材料深度的特定深度的特定深度。为了支持上述考虑,对材料进行了霍尔测量和四点探针测量。

著录项

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Engineering Electronics and Electrical.;Engineering Materials Science.
  • 学位 M.S.
  • 年度 2014
  • 页码 49 p.
  • 总页数 49
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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