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Structure and Properties of Al and Ga- Doped ZnO.

机译:Al和Ga掺杂的ZnO的结构和性能。

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摘要

Recently there is tremendous interest in Transparent conducting oxide (TCO) research due to the unlimited and exciting application areas. Current research is mostly focused on finding alternative low cost and sustainable materials in order to replace indium tin oxide (ITO), which caused serious concern due to the increasing cost of indium and chemical stability issues of ITO. The primary aim of this research is to develop alternative TCO materials with superior properties in order to increase the efficiency in optoelectronic applications, as well as to study the properties of these materials to fully characterize them. We have grown Al and Ga-doped ZnO films with an optimized composition under different deposition conditions in order to understand the effect of processing parameters on the film properties.;We report a detailed investigation on the structure-property correlations in Ga and Al codoped ZnO films on c-sapphire substrates where the thin film microstructure varies from nanocrystalline to single crystal. We have achieved highly epitaxial films with very high optical transmittance (close to 90%) and low resistivity (∼110muO-cm) values. The films grown in an ambient oxygen partial pressure (PO2 ) of 50 mTorr and at growth temperatures from room temperature to 600°C showed semiconducting behavior, whereas samples grown at a Po2 of 1 mTorr showed metallic nature. The most striking feature is the occurrence of resistivity minima at relatively high temperatures around 110 K in films deposited at high temperatures. The structure-property correlations reveal that point defects play an important role in modifying the structural, optical, electrical and magnetic properties and such changes in physical properties are controlled predominantly by the defect content.;To gain a better understanding of the conduction processes in doped ZnO thin films, we have studied the temperature variation of resistivity of some selected samples that showed some interesting behavior. Micro-structural, transport, optical and magnetic properties in ZnGa0.002Al 0.02O films grown by pulsed laser deposition under different growth conditions was studied. In ZnO films grown at substrate temperatures of 600°C most interesting features are the concomitant occurrence of high temperature resistivity minima and room temperature ferromagnetism with a high saturation magnetic moment and considerable coercivity. The temperature dependent resistivity data has been interpreted in the light of quantum corrections to conductivity in disordered systems, suggesting that the e-e interactions is the dominant mechanism in the weak-localization (WL) limit in the case of films showing resistivity minima. We propose that formation of oxygen vacancy-Zinc interstitial defect complex (VO-IZn) is responsible for the enhancement in n-type conductivity, and zinc vacancies (VZn) for the observed room temperature ferromagnetism.;ZnO nanostructures are gaining importance in various applications, from gas sensing to thin film transistors (TFTs). We have studied the micro-structural, transport, optical and magnetic properties in ZnO nanostructured films grown by pulsed laser deposition under different ambient conditions. We have investigated the nanostructures in detail through x-ray diffraction, SEM and TEM techniques. We have achieved relatively low room temperature resistivity and the occurrence of room temperature ferromagnetism with significant saturation magnetic moment of 1000 A/m with coercivity in the range of 100-150 Oe. Photoluminescence measurements were conducted to get an insight about the types of defects that occur under different growth conditions. Correlations between transport, optical and magnetic properties has been established in terms of these defects and their complexes. These nanostructured oxides with magnetic and optical properties are promising candidates in multifunctional spintronic and photonic devices.
机译:由于无限和令人兴奋的应用领域,最近对透明导电氧化物(TCO)的研究引起了极大的兴趣。当前的研究主要集中在寻找替代低成本和可持续发展的材料来代替铟锡氧化物(ITO),由于铟成本的上涨和ITO的化学稳定性问题,这引起了严重的关注。这项研究的主要目的是开发具有优异性能的替代TCO材料,以提高光电应用的效率,并研究这些材料的性能以充分表征它们。我们已经在不同的沉积条件下生长了具有优化成分的Al和Ga掺杂的ZnO薄膜,以便了解加工参数对薄膜性能的影响。;我们报告了有关Ga和Al共掺杂的ZnO的结构性质相关性的详细研究薄膜的微观结构从纳米晶体到单晶,在c-蓝宝石衬底上形成薄膜。我们已经获得了具有高透光率(接近90%)和低电阻率(〜110muO-cm)值的高外延膜。在50 mTorr的环境氧分压(PO2)以及从室温到600°C的生长温度下生长的薄膜表现出半导体性能,而在1 mTorr的Po2下生长的样品表现出金属性质。最显着的特征是在约110 K的较高温度下在高温下沉积的薄膜中电阻率极小值的出现。结构-性质的相关性表明,点缺陷在改变结构,光学,电和磁性能方面起着重要作用,而这种物理性能的变化主要由缺陷含量控制。;为了更好地理解掺杂中的导电过程对于ZnO薄膜,我们研究了一些选定样品的电阻率温度变化,这些样品表现出一些有趣的行为。研究了在不同生长条件下通过脉冲激光沉积生长的ZnGa0.002Al 0.02O薄膜的微观结构,传输,光学和磁性。在衬底温度为600°C的情况下生长的ZnO薄膜中,最有趣的特征是同时出现极小的高温电阻率和具有高饱和磁矩和相当大矫顽力的室温铁磁性。已经根据对无序系统中电导率的量子校正来解释了与温度相关的电阻率数据,这表明在膜的电阻率极小的情况下,e-e相互作用是弱定位(WL)极限的主要机制。我们认为,氧空位-锌间隙缺陷复合物(VO-IZn)的形成负责n型电导率的增强,锌空位(VZn)用于观察到的室温铁磁性。; ZnO纳米结构在各种应用中变得越来越重要从气体感应到薄膜晶体管(TFT)。我们已经研究了在不同环境条件下通过脉冲激光沉积生长的ZnO纳米结构薄膜的微观结构,传输,光学和磁性。我们已经通过X射线衍射,SEM和TEM技术详细研究了纳米结构。我们已经实现了较低的室温电阻率和室温铁磁性的发生,其饱和磁矩为1000 A / m,矫顽力在100-150 Oe范围内。进行光致发光测量以了解在不同生长条件下发生的缺陷类型。就这些缺陷及其复合物而言,已经建立了传输,光学和磁性性质之间的相关性。这些具有磁性和光学性质的纳米结构氧化物是多功能自旋电子和光子器件中有希望的候选者。

著录项

  • 作者

    Temizer, Namik Kemal.;

  • 作者单位

    North Carolina State University.;

  • 授予单位 North Carolina State University.;
  • 学科 Materials science.;Theoretical physics.
  • 学位 Ph.D.
  • 年度 2015
  • 页码 141 p.
  • 总页数 141
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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