首页> 外文学位 >APPLICATION OF MICROWAVE-INDUCED PLASMA EMISSION SPECTROSCOPY (MIPES) TO THE STUDY OF GAS/SOLID REACTIONS (KINETICS, FLUORINATION, TANTALUM/PLATINUM).
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APPLICATION OF MICROWAVE-INDUCED PLASMA EMISSION SPECTROSCOPY (MIPES) TO THE STUDY OF GAS/SOLID REACTIONS (KINETICS, FLUORINATION, TANTALUM/PLATINUM).

机译:微波诱导的等离子体发射光谱(MIPES)在气体/固体反应(动力学,氟化,钽/铂)研究中的应用。

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摘要

This work describes the development of an emission spectroscopic technique which facilitates (i) instantaneous gas/metal reaction rate measurements over a large temperature range in a single experimental run, and (ii) surface mass balances which are necessary for mechanistic understanding of high temperature gas/solid reactions. In this technique, a low pressure microwave induced plasma (MIP) excites characteristic emission from the atoms formed by the dissociation of the gaseous product species of the gas/metal reaction in a low pressure flow reactor.;The results of the metal evaporation and F-atom gasification experiments have revealed that the metal atom (Pt, Ta) emission line intensity is proportional to the metal flux from the surface over at least two decades (log-log plot). This linear response confirms that the concentration of product species in the plasma is sufficiently low as to not affect its nature. Moreover, our sublimation kinetics experiments are evidently sensitive to metal atom fluxes at the gas/metal interface as low as about 10('13) atom/cm('2) sec.;Flash evolution experiments have revealed that fluoride films form on both platinum and tantalum with thicknesses varying from 10 to 2000 monolayers. Fluorine adsorption on the film, dissolution into the film, diffusion in the film, reaction at the film/metal interface are reaction steps common to the kinetic models discussed in the present work. A diffusion coefficient of 10('-9) cm('2)/sec has been estimated for fluorine atom diffusion through the tantalum fluoride scale.;The MIPES flash evolution experiments are the first that directly show that thick fluoride films form on platinum and tantalum during reaction with fluorine. The new technique has been used to rapidly obtain instantaneous relative rate measurements in transient as well as steady-state experiments. It can also be applied to the study of chemical reactions with condensed stable product phases, so long as the product phase has a higher vapor pressure than that of the substrate. (Abstract shortened with permission of author.).;The reaction systems of choice involve fluorine, for which adequate reaction rates have been reported. The low dissociation energy of the molecule (157kJ/mol) makes the study of the heterogeneous reactions of atomic fluorine important because nearly complete dissociation can be achieved and the resulting atoms usually undergo heterogeneous reactions more rapidly than do molecules.
机译:这项工作描述了发射光谱技术的发展,该技术有助于(i)在单个实验运行中在较大温度范围内测量瞬时气体/金属反应速率,以及(ii)机械理解高温气体所必需的表面质量平衡/固体反应。在这项技术中,低压微波感应等离子体(MIP)激发由低压流动反应器中气体/金属反应的气态产物物种解离形成的原子发出的特征发射。;金属蒸发和F的结果原子气化实验表明,在至少二十年中,金属原子(Pt,Ta)的发射谱线强度与来自表面的金属通量成正比(对数对数图)。该线性响应证实血浆中产物种类的浓度足够低以至于不影响其性质。此外,我们的升华动力学实验显然对气体/金属界面上的金属原子通量敏感,其低至约10('13)atom / cm('2)sec .;闪蒸实验表明,在两个铂上均形成氟化物膜钽的厚度在10到2000个单层之间。氟在膜上的吸附,在膜中的溶解,在膜中的扩散,在膜/金属界面的反应是本工作中讨论的动力学模型共有的反应步骤。氟原子在氟化钽垢上的扩散系数估计为10('-9)cm('2)/ sec .; MIPES闪蒸实验是第一个直接表明在铂和硅上形成厚氟化物膜的实验。与氟反应过程中的钽。这项新技术已被用于快速获得瞬态和稳态实验中的瞬时相对速率测量值。只要产物相的蒸气压比底物的蒸气压高,它也可以用于研究具有冷凝的稳定产物相的化学反应。 (摘要经作者许可缩短。);选择的反应体系涉及氟,已有报道已报道了适当的反应速率。分子的低解离能(157kJ / mol)使得研究原子氟的非均相反应非常重要,因为可以实现几乎完全的离解,并且所得的原子通常比分子更快地经历非均相反应。

著录项

  • 作者

    ONER, ATILLA MEHMET.;

  • 作者单位

    Yale University.;

  • 授予单位 Yale University.;
  • 学科 Engineering Chemical.
  • 学位 Ph.D.
  • 年度 1985
  • 页码 184 p.
  • 总页数 184
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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