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MBE growth and characterization of lead-salt semiconductors for mid-infrared detector and laser application.

机译:MBE的生长和铅盐半导体的表征,用于中红外探测器和激光应用。

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摘要

IV-VI semiconductors grown by molecular beam epitaxy (MBE) on various substrates are extensively attractive for mid-infrared optoelectronic device application. The main goal of this research is to improve device performance by lowering defects densities in the epitaxial layers during MBE growth of Pb-salt materials on a lattice-mismatched substrate. Most of the work is based on MBE growth of monocrystalline PbSe on Si (111) substrates. Details of experiments are described and supported by reflection high-energy electron diffraction (RHEED) patterns. The effect of the in-situ surface treatment methods with a motivation of improving electrical and morphological properties of epilayers is demonstrated.;A detailed study on surface morphologies and chemical composition of growth pits and dislocations in PbSe epilayers is provided. Various growth defects are investigated by scanning electron microscopy (SEM) and energy-dispersive x-ray analysis (EDXA). Through a series of experimental studies, it has been confirmed that the vast majority of growth pits within PbSe epilayers contains either single or multiple PbSe microcrystals with a distinct cuboid shape.;Lead salt mid-infrared optoelectronic devices are fabricated on various substrates. Several other research works include: (1) Edge-emitting infrared lasers on BaF2 (110) substrates. A method of substrate transfer from a BaF2 substrate to a copper heat-sink is developed. Pulsed photoluminescence (PL) measurements are conducted with help of Fourier transform infrared (FTIR) spectroscopy method during every single step of device processing. (2) Mid-infrared detectors on silicon (111) substrates. Single-element PbSnSe infrared detectors have been made on CaF2/Si (111) heterostructures; I-V measurement is accomplished on these detectors.;Key words: Molecular beam epitaxy, Pb-salts, in-situ surface treatment, defects, Mid-infrared optoelectronic devices.
机译:通过分子束外延(MBE)在各种衬底上生长的IV-VI半导体对于中红外光电器件的应用具有广泛的吸引力。这项研究的主要目的是通过降低在晶格不匹配的衬底上的铅盐材料的MBE生长期间外延层中的缺陷密度来提高器件性能。大多数工作基于在Si(111)衬底上单晶PbSe的MBE生长。通过反射高能电子衍射(RHEED)模式描述并支持了实验的详细信息。证明了原位表面处理方法对改善外延层的电学和形态学性能的影响。;提供了对PbSe外延层的表面形貌和生长坑的化学组成以及位错的详细研究。通过扫描电子显微镜(SEM)和能量色散X射线分析(EDXA)研究了各种生长缺陷。通过一系列实验研究,已经证实,PbSe外延层内的绝大多数生长坑都包含具有明显长方体形状的单个或多个PbSe微晶。在各种基板上制造铅盐中红外光电器件。其他一些研究工作包括:(1)在BaF2(110)衬底上的边缘发射红外激光。开发了一种将衬底从BaF2衬底转移到铜散热器的方法。在器件处理的每个步骤中,借助于傅立叶变换红外(FTIR)光谱法进行脉冲光致发光(PL)测量。 (2)在硅(111)基板上的中红外探测器。已经在CaF2 / Si(111)异质结构上制造了单元素PbSnSe红外探测器。关键词:分子束外延,铅盐,原位表面处理,缺陷,中红外光电器件。

著录项

  • 作者

    Li, Donghui.;

  • 作者单位

    The University of Oklahoma.;

  • 授予单位 The University of Oklahoma.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 128 p.
  • 总页数 128
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:37:49

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