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The high-temperature oxidation of silicon carbide and chemically vapor-deposited silicon carbide coated graphite.

机译:碳化硅和化学气相沉积的碳化硅涂层石墨的高温氧化。

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摘要

One of the major challenges in the development of protective SiC coatings for graphite is preventing oxidation of the graphite substrate when cracks have formed in the SiC coating. There is evidence that the addition of boron results in the formation of a low melting oxide which either flows and covers the exposed carbon substrate or reacts with the silica scale to form a liquid borosilicate.; The effect of boron additions on the oxidation of SiC has been investigated by comparing the oxidation behavior of sintered {dollar}alpha{dollar}-SiC, which contains 0.5 wt% boron, with that of high purity CVD SiC. The boron in sintered {dollar}alpha{dollar}-SiC does not significantly affect the growth rate of either amorphous silica or cristobalite between 1400{dollar}spcirc{dollar}C and 1600{dollar}spcirc{dollar}C, but does result in the formation of bubbles in the silica scale formed between 1230{dollar}spcirc{dollar}C and 1550{dollar}spcirc{dollar}C.; The effect of boron on the oxidation of graphite through cracks in SiC coatings has been investigated by comparing the oxidation behavior of graphite coated with SiC, with boron-containing coatings and with double layer coatings consisting of a SiC outer layer and a boron-containing interlayer. Above 900{dollar}spcirc{dollar}C, the oxidation of cracked SiC coated graphite is limited by diffusion through the cracks, but below 900{dollar}spcirc{dollar}C, the oxidation rate is influenced by the chemical reaction. Boron-containing coatings alone decrease the oxidation rate of graphite. However, SiC coatings with a boron-containing interlayer can provide oxidation protection of graphite for up to 9 days at 1500{dollar}spcirc{dollar}C by forming a liquid borosilicate which covers the graphite substrate.
机译:开发用于石墨的保护性SiC涂层的主要挑战之一是当在SiC涂层中形成裂纹时如何防止石墨基底的氧化。有证据表明,硼的添加会导致形成低熔点氧化物,该氧化物会流动并覆盖裸露的碳基材,或者与二氧化硅垢反应形成液态硼硅酸盐。通过比较含0.5%(重量)硼的烧结{美元}α{美元} -SiC与高纯度CVD SiC的氧化行为,研究了硼添加对SiC氧化的影响。烧结的{美元}α{美元} -SiC中的硼不会显着影响1400℃至1600℃之间的无定形二氧化硅或方石英的生长速率,但确实会在1230 {美元至1550 {美元之间形成的二氧化硅鳞片中形成气泡。通过比较涂有SiC的石墨,含硼涂层和由SiC外层和含硼中间层组成的双层涂层的石墨的氧化行为,研究了硼对通过SiC涂层中的裂纹氧化石墨的影响。 。高于900℃时,裂化的SiC涂覆的石墨的氧化受到通过裂纹的扩散的限制,而低于900℃时,氧化速率受化学反应的影响。单独的含硼涂层会降低石墨的氧化速率。但是,具有含硼中间层的SiC涂层可通过形成覆盖石墨基材的液态硼硅酸盐在1500 {C的温度下提供长达9天的石墨氧化保护。

著录项

  • 作者

    Fergus, Jeffrey Wayne.;

  • 作者单位

    University of Pennsylvania.;

  • 授予单位 University of Pennsylvania.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1990
  • 页码 249 p.
  • 总页数 249
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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