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Electrochemical and surface chemical studies of n-gallium arsenide photoanodes.

机译:n-砷化镓光阳极的电化学和表面化学研究。

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The electrochemical response of n-type gallium arsenide (n-GaAs) photoanodes was monitored while in contact with aqueous basic selenide electrolytes before and after exposure to separate aqueous 0.010 M solutions of transition metal ions. Representative members of the transition metal complexes included {dollar}rm RuClsb3{lcub}cdot{rcub}xHsb2O{dollar}, {dollar}rm RhClsb3{lcub}cdot{rcub}xHsb2O{dollar}, {dollar}rm IrClsb3{lcub}cdot{rcub}xHsb2O{dollar}, {dollar}rm OsClsb3{lcub}cdot{rcub}xHsb2O{dollar}, (Co(III)(NH{dollar}sb3)sb6{dollar}) (Br){dollar}sb3{dollar}, (Ru(III)(NH{dollar}sb3)sb5{dollar}(Cl)) (Cl){dollar}sb2{dollar}, and (Ru(II)(NH{dollar}sb3)sb5{dollar}(OH{dollar}sb2{dollar})) (Cl){dollar}sb2{dollar}. Several members of this group were shown to yield improved current-voltage (I-V) characteristics at the n-GaAs/KOH - Se{dollar}sp{lcub}-/2-{rcub}{dollar}(aq) junction. A comparison of the current-voltage properties for p-type and n{dollar}sp+{dollar}-type GaAs electrodes in the dark, as well as for 10% Sn-doped {dollar}rm Insb2Osb3{dollar} electrodes, demonstrated that the sources of the improved I-V response following metal ion exposure was a large decrease in the overpotentials, at a given current density, required for selenide oxidation.; An extensive surface analytic study revealed that Co(III) ammine complexes became adsorbed on GaAs surfaces from solutions of pH {dollar}>{dollar} 9 by a redox reaction involving sacrificial oxidation of the GaAs substrate. The product in all cases was an amorphous Co(OH){dollar}sb2{dollar} surface layer. The stoichiometry of the redox reaction involves one equivalent of GaAs per six equivalent Co(III) species. Following immersion into the KOH - Se{dollar}sp{lcub}-/2-{rcub}{dollar}(aq) electrolyte, the Co(OH){dollar}sb2{dollar} surface layer was converted to a CoSe{dollar}sb2{dollar}-like phase that is believed to be the active electrocatalyst responsible for the reduced overpotential dependence following Co(III) ammine treatment.; Finally, the surface composition of n-GaAs electrodes that had been specifically etched to produce either a clean, a metallic arsenic covered, or a uniformly oxidized surface were probed by high resolution XPS and were correlated with the n-GaAs I-V properties in aqueous and non-aqueous electrolytes.
机译:在暴露于单独的0.010 M过渡金属离子水溶液之前和之后,在与碱性硒化物水溶液接触的同时监测n型砷化镓(n-GaAs)光阳极的电化学响应。过渡金属配合物的代表成员包括{美元} rm RuClsb3 {lcub} cdot {rcub} xHsb2O {dollar},{美元} rm RhClsb3 {lcub} cdot {rcub} xHsb2O {dollar},{美元} rm IrClsb3 {lcub} cdot {rcub} xHsb2O {dollar},{dol} rm OsClsb3 {lcub} cdot {rcub} xHsb2O {dollar},(Co(III)(NH {dollar} sb3)sb6 {dollar})(Br){dollar} sb3 {dollar},(Ru(III)(NH {dollar} sb3)sb5 {dollar}(Cl))(Cl){dollar} sb2 {dollar}和(Ru(II)(NH {dollar} sb3)sb5 {美元}(OH {dollar} sb2 {dollar}))(Cl){dollar} sb2 {dollar}。该组中的几个成员显示出在n-GaAs / KOH-Se {dollar} sp {lcub}-/ 2- {rcub} {dollar}(aq)结处产生改善的电流-电压(I-V)特性。比较在黑暗中p型和n {dollar} sp + {dollar}型GaAs电极以及10%Sn掺杂{dolrm} rm Insb2Osb3 {dollar}电极的电流电压特性,结果表明:在金属离子暴露后,IV响应改善的原因是,在给定的电流密度下,硒化物氧化所需的过电势大大降低。广泛的表面分析研究表明,Co(III)氨基配合物通过涉及牺牲性砷化镓衬底氧化的氧化还原反应而从pH为9的溶液吸附到GaAs表面上。在所有情况下,产物均为无定形的Co(OH){dollar} sb2 {dollar}表面层。氧化还原反应的化学计量涉及每六当量的Co(III)物种一当量的GaAs。浸入KOH-Se {dollar} sp {lcub}-/ 2- {rcub} {dollar}(aq)电解液后,Co(OH){dollar} sb2 {dollar}表面层被转化为CoSe {dollar } sb2 {dollar}-样相,被认为是在Co(III)胺处理后降低过电势依赖性的活性电催化剂。最后,通过高分辨率XPS探测了经过专门刻蚀以产生干净的,金属砷覆盖的或均匀氧化的表面的n-GaAs电极的表面组成,并将其与n-GaAs IV在水溶液中的性质相关联。非水电解质。

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