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Electrical properties of polycrystalline solar cell silicon.

机译:多晶硅太阳能电池的电性能。

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摘要

The electrical properties of polycrystalline silicon (p-type) were investigated by resistivity, C-V, and DLTS measurements. In particular, the influence of oxygen, carbon, and the fast diffusing transition elements (Cu, Ni, Fe, and Cr) in polycrystalline silicon has been studied. Ohmic contacts on polycrystalline silicon specimens were made successfully by Ga-In application by scrubbing or Al evaporation followed by short annealing. For Schottky diodes, Ti/poly-Si (p-type) was used for C-V and DLTS measurements. The objective was to identify the defects which are mainly responsible for the observed electrical changes.;The specimens were Cast and Ribbon polycrystalline silicon with different impurity concentrations. Both specimens were annealed over a wide range of temperatures, between 300;For an investigation of the influence of particular transition elements, the metals (Cu, Ni, Fe and Cr) were intentionally deposited on polished surfaces of the Cast and Ribbon Si specimens, and the electrical properties of specimens doped with transition elements and of undoped specimens were investigated and compared. The electrical properties of various transition metals in polycrystalline silicon showed different behavior depending on the diffusing temperature and cooling rate. The specimens which were intentionally diffused with Cu or Ni did not show any significant electrical change compared with undoped specimens. However, the specimens which were intentionally diffused with Fe or Cr showed a significant decrease of the carrier concentrations and an increase of the resistivities and trap concentrations compared with undoped specimens. The electrical changes are more prominent with the specimens that were quenched or exposed to a higher diffusion temperature.
机译:通过电阻率,C-V和DLTS测量研究了多晶硅(p型)的电性能。特别是,研究了氧,碳和多晶硅中快速扩散过渡元素(Cu,Ni,Fe和Cr)的影响。通过擦洗或蒸镀铝,然后进行短时退火,通过Ga-In应用成功地在多晶硅样品上形成了欧姆接触。对于肖特基二极管,Ti / poly-Si(p型)用于C-V和DLTS测量。目的是确定主要是造成观察到的电气变化的缺陷。样品是具有不同杂质浓度的铸造和带状多晶硅。两种样品均在300至300°C的较宽温度范围内退火;为研究特定过渡元素的影响,有意将金属(Cu,Ni,Fe和Cr)沉积在Cast和Ribbon Si样品的抛光表面上,对掺有过渡元素的样品和未掺入样品的电性能进行了研究和比较。多晶硅中各种过渡金属的电性能表现出不同的行为,这取决于扩散温度和冷却速率。与未掺杂样品相比,故意扩散有Cu或Ni的样品没有显示任何明显的电变化。然而,与未掺杂的样品相比,故意用Fe或Cr扩散的样品显示出载流子浓度显着降低,电阻率和阱浓度升高。淬火或暴露于较高扩散温度的样品的电学变化更为明显。

著录项

  • 作者

    Park, Jihong.;

  • 作者单位

    Case Western Reserve University.;

  • 授予单位 Case Western Reserve University.;
  • 学科 Engineering Materials Science.;Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 1994
  • 页码 172 p.
  • 总页数 172
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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