Electron-matter interactions in x-ray and electron beam lithography.

摘要

This is a study of photoelectron scattering in solids, its consequences and practical applications in the semiconductor industry. The purpose of this study is to harness the current knowledge developed in the physics community in different aspects of photoelectron scattering in solids, and present a methodology useful to determine its influence in physical changes in materials used in manufacturing processes of semiconductor circuits.;As a consequence of this research, new theoretical models have been developed to describe the scattering of energetic electrons in solid materials and the energy redistribution of photons in X-ray lithography. These models have been found useful to predict the ultimate resolution in patterning ability for X-ray lithography in agreement with experiments from around the world.