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Positron annihilation studies of ferroelectrics and related perovskite oxides.

机译:铁电体和相关钙钛矿氧化物的正电子an灭研究。

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摘要

Advances in the fabrication of ferroelectric thin films have resulted in the use of ferroelectrics in non-volatile memories, integrated pyroelectric detectors and electro-optic switches. Although the material degradation and fatigue properties have improved considerably, a clear understanding of the mechanisms is still lacking. The two main problems that currently plague the ferroelectric devices are failure due to imprint and/or fatigue. Some of the current models indicate that point defects may play a significant role in these mechanisms.; Positron annihilation techniques have been applied to characterize vacancy related defects in ferroelectric thin film structures. Both, bulk ferroelectric material and layered capacitor structures, were studied. Lifetime studies on bulk ceramic plate Pb{dollar}sb{lcub}rm x{rcub}{dollar}La{dollar}sb{lcub}rm 1-x{rcub}{dollar}Zr{dollar}sb{lcub}rm y{rcub}{dollar}Ti{dollar}sb{lcub}rm 1-y{rcub}{dollar} samples indicate that there might be a lead-oxygen vacancy complex assisted pinning associated with the fatigue mechanisms. Lifetime studies on bulk ceramic plate samples subjected to various anneals indicate that there might be some vacancy complex formation or clustering of defects at temperatures above 600{dollar}spcirc{dollar}C. The Variable Energy Positron Beam (VEPB) technique was used to study sol-gel and laser ablated layered capacitor structures. We've looked at the effect of processing conditions, donor doping and post growth anneals on the vacancy related defects in both sol-gel and laser ablated ferroelectric thin films. The concentration of open volume or negatively charged defects is effected by the type of surface electrodes as well as by donor doping. In the case of the sol-gel grown samples, the capacitors with the oxide electrode (RuO{dollar}sb2{dollar}) have a lower concentration of defects as compared to the samples with metal electrodes (Pt). VEPB studies on the laser ablated structures indicate that the electrode may have the more dominant effect on the ferroelectric capacitors than the ferroelectric material itself.
机译:铁电薄膜制造的进步导致铁电在非易失性存储器,集成热释电检测器和光电开关中的使用。尽管材料的降解和疲劳性能已得到显着改善,但仍缺乏对机理的清楚理解。当前困扰铁电设备的两个主要问题是由于压印和/或疲劳引起的故障。当前的一些模型表明,点缺陷可能在这些机制中起重要作用。正电子an没技术已应用于表征铁电薄膜结构中与空位有关的缺陷。研究了块状铁电材料和层状电容器结构。大块陶瓷板Pb {dollar} sb {lcub} rm x {rcub} {dollar} La {dollar} sb {lcub} rm 1-x {rcub} {dollar} Zr {dollar} sb {lcub} rm的终生研究{rcub} {dollar} Ti {dollar} sb {lcub} rm 1-y {rcub} {dollar}样本表明可能存在与疲劳机制相关的铅氧空位复合物辅助钉扎。对经过各种退火处理的大块陶瓷板样品进行的终生研究表明,温度高于600spspcirc {dollar} C时,可能会形成一些空位复合物或缺陷聚集。可变能量正电子束(VEPB)技术用于研究溶胶-凝胶和激光烧蚀的分层电容器结构。我们已经研究了加工条件,施主掺杂和生长后退火对溶胶-凝胶和激光烧蚀铁电薄膜中与空位有关的缺陷的影响。开孔体积或带负电荷的缺陷的浓度受表面电极的类型以及施主掺杂的影响。在溶胶-凝胶生长的样品的情况下,与具有金属电极(Pt)的样品相比,具有氧化物电极的电容器(RuO {dollar} sb2 {dollar})的缺陷浓度较低。 VEPB对激光烧蚀结构的研究表明,与铁电材料本身相比,电极对铁电电容器的影响可能更大。

著录项

  • 作者

    Krishnan, Ajit C.;

  • 作者单位

    Michigan Technological University.;

  • 授予单位 Michigan Technological University.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1996
  • 页码 113 p.
  • 总页数 113
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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