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Intersubband light emission and electrical bistability in SiGe/Si quantum structures.

机译:SiGe / Si量子结构中的子带间发光和电双稳态。

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摘要

This dissertation deals with band engineering in Si/SiGe structures and its possible applications to light emission and static random access memory (SRAM). It consists of two main parts. The first part deals with band engineering using hetero-structures and its possible application to light emission. The second part deals with band engineering using doping modulation and its possible application to SRAM cells.; Part I. Light emission from Si/SiGe based structures has received considerable interest due to its possible applications in optoelectronics and more importantly, its compatibility with the current mainstream Si technology. The integration of optical components onto a Si-based chip allows further functional integration and consequently the realization of new concepts. On the other hand, Si/SiGe based materials have indirect bandgaps, which yields interband radiative recombination that is very slow compared to other non-radiative interband recombination mechanisms, such as Auger recombination. In this dissertation, a new method of light emission based on Si/SiGe quantum well structures is proposed. The relaxation times are calculated and the threshold current is estimated.; Part II. The bistability in delta-doped Si diodes is very attractive for SRAM applications. This is because, in conventional SRAMs, a circuit is built to achieve the bistability in its logic operations. This usually takes six transistors for one cell. Therefore, packing is limited. To circumvent this problem, new cell topologies were recently {dollar}rm proposedsp{lcub}1,2{rcub}.{dollar} The basic idea involves the use of a device with built-in bistability in its I-V characteristics and therefore, the SRAM cell can be greatly simplified. In fact, only three devices are needed, namely, a bistable diode, a control transistor and a load. This essentially reduces the device count by half and if we stack the load resistor on top of the transistor, the cell area can be reduced even further. In this dissertation, novel Si based bistable diodes are studied. The bistability is achieved through the quantum effect of doping modulation.
机译:本文主要研究Si / SiGe结构中的能带工程及其在发光和静态随机存取存储器(SRAM)中的可能应用。它由两个主要部分组成。第一部分涉及使用异质结构的能带工程及其在发光中的可能应用。第二部分涉及使用掺杂调制的频带工程及其在SRAM单元中的可能应用。第一部分,基于Si / SiGe的结构的发光引起了人们极大的兴趣,这是因为它可能在光电中应用,更重要的是,它与当前主流的Si技术兼容。将光学组件集成到基于Si的芯片上可以实现进一步的功能集成,从而实现新概念。另一方面,基于Si / SiGe的材料具有间接带隙,与其他非辐射带间重组机制(例如俄歇重组)相比,带间辐射复合非常慢。本文提出了一种基于Si / SiGe量子阱结构的发光方法。计算弛豫时间并估算阈值电流。第二部分掺三角形硅二极管的双稳态对SRAM应用非常有吸引力。这是因为,在常规的SRAM中,构建电路以实现其逻辑操作的双稳态。一个单元通常需要六个晶体管。因此,包装受到限制。为了解决这个问题,最近提出了新的细胞拓扑结构{dollar} rm proposalsp {lcub} 1,2 {rcub}。{dollar}基本思想涉及使用具有内置双稳态的IV特性的设备,因此, SRAM单元可以大大简化。实际上,仅需要三个器件,即双稳态二极管,控制晶体管和负载。这实际上将器件数量减少了一半,而且如果我们将负载电阻器堆叠在晶体管的顶部,则可以进一步减小单元面积。本文研究了新型的硅基双稳态二极管。双稳态是通过掺杂调制的量子效应来实现的。

著录项

  • 作者

    Zhu, Xuegen.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Engineering Electronics and Electrical.; Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 1997
  • 页码 161 p.
  • 总页数 161
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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