Supersonic molecular beam studies of the dissociative chemisorption of group IV hydrides on single crystal silicon and germanium.

摘要

upersonic molecular beam scattering techniques were employed to investigate the reaction of SiH;In a separate project, the thermal and plasma-assisted nitridation of GaAs(100) using NH;The influence of simultaneous atomic H flux on selectivity during deposition of Si thin film employing a supersonic molecular beam of