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Wafer-bonded bottom-emitting 850 nm VCSELs for short distance free-space optical interconnections.

机译:晶圆键合底部发射的850 nm VCSEL,用于短距离自由空间光学互连。

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摘要

Free-space optical interconnects (FSOI) have been the subject of intense research for application to parallel computing and communication systems. Meeting the demands of higher speed computer systems require alternatives to bandwidth limited and power-dissipative electrical interconnects. Implementing FSOI at chip-to-chip or board-to-board level by hybrid integration of optoelectronic devices onto Si-based systems is a promising solution to achieve higher performance computer systems.; Vertical-cavity surface-emitting lasers (VCSELs) are of great interest for FSOI, because they can be fabricated into 2-D arrays, their output beams are circularly symmetric with controllable divergence angle, and their ultra-low threshold current laser operation eliminates the need for array element pre-bias circuits. Bottom-emitting VCSELs are particularly suitable for hybrid integration with Si circuitry using a flip-chip bonding technology. A large VCSEL array can be transferred in one step and the resultant device capacitance is largely reduced. Bottom-emitting VCSEL arrays to date have predominately operated at 980 nm to make use of the transparency of GaAs substrates at this wavelength.; To enable 850 nm VCSELs to emit light through the substrates, a wafer bonding technology was employed in this study to replace the absorbing GaAs substrates with transparent substrates. Various substrates---p-GaP, i-GaP, and sapphire---and different device configurations were used to optimize the device performance. Carrier and optical confinement for the devices were achieved by using thin (200 A) AlAs oxide apertures placing at the standing wave node position in the first period of p-DBR to improve the manufacturability of oxide-confined VCSELs. The elements of the developed uniform 5 x 5 VCSELs array bonded on sapphire substrate exhibit an average threshold current of 346 muA and an average external quantum efficiency of 57% with maximum variation of 4%. The devices operate in single mode up to 3 mA of current excitation and the output power is more than 2 mW under this condition. A large, 8 x 8, VCSEL array was also demonstrated after improving the uniformity of wafer bonding and device fabrication processes. Short (visible) wavelength bottom-emitting VCSELs are possible by using our approach.
机译:自由空间光互连(FSOI)已成为应用于并行计算和通信系统的广泛研究的主题。为了满足更高速度的计算机系统的需求,需要替代带宽受限和耗能的电互连。通过将光电器件混合集成到基于Si的系统中,在芯片对芯片或板对板级别上实现FSOI,是实现更高性能的计算机系统的有希望的解决方案。垂直腔面发射激光器(VCSEL)对于FSOI非常重要,因为它们可以制造成二维阵列,其输出光束呈圆对称且发散角可控,并且其超低阈值电流激光器操作消除了需要阵列元件预偏置电路。底部发射VCSEL特别适合使用倒装芯片键合技术与Si电路混合集成。大型VCSEL阵列可以一步转移,从而大大降低了器件的电容。迄今为止,底部发射的VCSEL阵列主要在980 nm下工作,以利用该波长下GaAs衬底的透明性。为了使850 nm VCSEL能够通过基板发光,在这项研究中采用了晶圆键合技术,将吸收性GaAs基板替换为透明基板。各种衬底-p-GaP,i-GaP和蓝宝石-和不同的设备配置被用来优化设备性能。器件的载流子和光学限制是通过在p-DBR的第一阶段中使用位于驻波节点位置的薄(200 A)AlAs氧化物孔来实现的,以改善氧化物限制的VCSEL的可制造性。结合在蓝宝石衬底上的已开发的均匀5 x 5 VCSEL阵列的元件显示出346μA的平均阈值电流和57%的平均外部量子效率,最大变化为4%。该器件在单模模式下可在高达3 mA的电流激励下工作,在这种情况下,输出功率大于2 mW。在改善晶圆键合和设备制造工艺的均匀性之后,还展示了一个大型的8 x 8 VCSEL阵列。通过使用我们的方法,可以发出短(可见)波长的底部发射VCSEL。

著录项

  • 作者

    Lin, Chao-Kun.;

  • 作者单位

    University of Southern California.;

  • 授予单位 University of Southern California.;
  • 学科 Engineering Electronics and Electrical.; Physics Optics.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 164 p.
  • 总页数 164
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;光学;
  • 关键词

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