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A silicon/silver multilayer Fabry-Perot bandpass transmission filter for use near 28.4 nm.

机译:硅/银多层Fabry-Perot带通透射滤光片,用于28.4 nm附近。

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摘要

A transmissive Fabry-Perot filter was designed, fabricated, and tested in an attempt to reduce the bandpass near the Fe XV spectral line in the extreme ultraviolet. The design of the filter involved analysis of the optical constants of the available materials, examination of binary alloy tables for candidate material pairs, and computer modeling of possible configurations. Of the materials available, silicon and silver were determined to best fit the requirements of high throughput, low off-peak transmissivity, and minimal rate of interdiffusion. The optical component was fabricated using radio frequency triode sputter deposition onto silicon wafer substrates. An effort was also made to produce a transmissive substrate consisting of a thin silicon nitride window on a silicon wafer support structure using standard photolithographic and wet-etch techniques. Testing of the fabricated multilayer device included x-ray diffractometry, Auger spectroscopy, transmission electron microscopy, and reflectometry in the extreme ultraviolet.; The designed Fabry-Perot multilayer filter had a theoretical peak transmission of 1.55% at 28.0 nm and a full width at half maximum of 2.0 nm. The fabricated filter suffered from oxidation of its exposed silicon layer, addition of an adsorbed water layer, an interfacial roughness of between 0.5 and 1.2 nm, and a thickness error of approximately 0.5 nm. If this filter were tested as a free-standing filter, its theoretical peak transmissivity would be between 1.05% and 0.75% at 27.0 nm with a full width at half maximum between 2.8 nm and 3.7 nm.
机译:设计,制造和测试透射式Fabry-Perot滤光片,以尝试减少极紫外光下Fe XV光谱线附近的带通。滤波器的设计涉及对可用材料的光学常数的分析,对候选材料对的二元合金表的检查以及可能配置的计算机建模。在可用的材料中,已确定硅和银最适合高通量,低峰下透射率和最小互扩散率的要求。使用射频三极管溅射沉积法在硅晶片基板上制造光学组件。还努力使用标准的光刻和湿法蚀刻技术在硅晶片支撑结构上制造由氮化硅薄窗构成的透射基板。所制造的多层器件的测试包括X射线衍射仪,俄歇光谱仪,透射电子显微镜和极紫外反射仪。设计的Fabry-Perot多层滤光片在28.0 nm处的理论峰透射率为1.55%,在半峰处的全宽为2.0 nm。所制造的过滤器遭受其暴露的硅层的氧化,添加了吸附的水层,界面粗糙度在0.5至1.2nm之间以及厚度误差约为0.5nm的情况。如果将此滤光片作为独立式滤光片进行测试,则其理论峰值透射率在27.0 nm处将在1.05%至0.75%之间,并且半峰全宽在2.8 nm至3.7 nm之间。

著录项

  • 作者

    Gore, David B.;

  • 作者单位

    The University of Alabama at Birmingham.;

  • 授予单位 The University of Alabama at Birmingham.;
  • 学科 Physics Optics.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 114 p.
  • 总页数 114
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 光学;
  • 关键词

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