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Computer simulation studies of interface growth of 1+1 dimensional thin films and of bulk silicon germanium.

机译:1 + 1维薄膜和体硅锗界面生长的计算机模拟研究。

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摘要

Using computer simulations, we have performed extensive studies of the interface growth of two systems: 1+1 dimensional thin films and bulk Silicon-Germanium mixtures. In the 1+1 dimensional thin film study, several models of thin films were investigated, including molecular beam epitaxy, “zero flux” diffusion, absorption and evaporation, the Edwards-Wilkinson and Restricted Edwards-Wilkinson models. In examining bulk Silicon-Germanium, we performed the first computational studies of phase unmixing in an elastic three dimensional model. We investigated the phase separation of the binary alloy in both the spinodal decomposition and nucleation regimes by investigating two points in temperature and concentration space.; For 1+1 dimensional thin film study, we used a solid-on-solid model with periodic boundary conditions. The interfacial width and structure factor were measured for the thin films for various lattice sizes. From those results, we extracted dynamic finite size scaling exponents for the respective models. For the molecular beam epitaxy model, we obtained α = 1.63 ± 0.07, β = 0.36 ± 0.02, and z = 4.2 ± 0.1, which self-consistently agreed with the estimate z = α/β = 4.53 ± 0.32. Comparing our results to other models examined here and to other works, we concluded that the molecular beam epitaxy model fell into the Das Sarma Tamborenea/Wolf-Villain universality class, and not the Kardar-Parisi-Zhang or Edwards-Wilkinson classes.; For the bulk Silicon-Germanium binary alloy study, we used a deformable diamond lattice with periodic boundary conditions with 4096 unit cells and 32,768 atoms. The Stillinger-Weber potential was used to describe the interactions. Thus, elastic interactions, allowing the atoms to vibrate off-lattice, were included, as well as homogeneous volume fluctuations to keep the system at constant pressure. For comparison, we investigated the effect of turning the elastic interactions off. By measuring the structure factor and spatial correlation function, we examined the process by which the system phase separated in two different growth regimes: spinodal decomposition and nucleation. From these measurements, we further extracted various scaling exponents, which further describe the growth processes in the respective regimes. Our results are compared to the results of other binary alloy rigid lattice simulations.
机译:使用计算机模拟,我们对两个系统的界面生长进行了广泛的研究:1 + 1维薄膜和块状硅锗混合物。在1 + 1维薄膜研究中,研究了几种薄膜模型,包括分子束外延,“零通量”扩散,吸收和蒸发,Edwards-Wilkinson模型和Restricted Edwards-Wilkinson模型。在检查块状硅锗中,我们在弹性三维模型中进行了相解混的首次计算研究。通过研究温度和浓度空间中的两个点,我们研究了在旋节线分解和成核状态下二元合金的相分离。对于1 + 1维薄膜研究,我们使用了具有周期性边界条件的固体对固体模型。测量了各种晶格尺寸的薄膜的界面宽度和结构因子。从这些结果中,我们提取了各个模型的动态有限尺寸缩放指数。对于分子束外延模型,我们获得了α= 1.63±0.07,β= 0.36±0.02和 z = 4.2±0.1,这与估计值 z =α/β= 4.53±0.32。将我们的结果与本文研究的其他模型以及其他工作进行比较,我们得出的结论是,分子束外延模型属于Das Sarma Tamborenea / Wolf-Villain通用性类别,而不属于Kardar-Parisi-Zhang或Edwards-Wilkinson类别。对于大量的硅锗二元合金研究,我们使用了具有周期性边界条件的可变形金刚石晶格,该晶格具有4096个晶胞和32,768个原子。 Stillinger-Weber势用于描述相互作用。因此,其中包括允许原子振动脱离晶格的弹性相互作用以及均匀的体积波动,以使系统保持恒定压力。为了进行比较,我们研究了关闭弹性相互作用的效果。通过测量结构因子和空间相关函数,我们检查了系统相在两种不同的生长方式中分离的过程:旋节线分解和成核。从这些测量中,我们进一步提取了各种缩放指数,这些指数进一步描述了各个方案中的生长过程。我们的结果与其他二元合金刚性晶格模拟的结果进行了比较。

著录项

  • 作者

    Lees, John James.;

  • 作者单位

    University of Georgia.;

  • 授予单位 University of Georgia.;
  • 学科 Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 2001
  • 页码 156 p.
  • 总页数 156
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 O49;
  • 关键词

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