首页> 外文学位 >Theoretical studies of isolated silicon and germanium clusters, and silicon clusters on silicon(111)-7x7 surface.
【24h】

Theoretical studies of isolated silicon and germanium clusters, and silicon clusters on silicon(111)-7x7 surface.

机译:对孤立的硅和锗团簇以及sil(111)-7x7表面上的硅团的理论研究。

获取原文
获取原文并翻译 | 示例

摘要

We have performed a systematic search for the ground state geometry of Si+n and Si-n in the size range 3 ≤ n ≤ 20 within the framework of density functional theory (DFT) with the local density approximation (LDA) and generalized gradient approximation (GGA). Various properties such as ionization potentials for neutral clusters, vertical detachment energies and photoelectron spectra for anions, fragmentation pathways and dissociation energies for cations, and mobilities for both anions and cations, are calculated and compared with experiments. The structures for medium-sized clusters (10 ≤ n ≤ 20) generally follow the prolate “stacked Si9 tricapped trigonal prism (TTP)” pattern. Both bulk silicon and bulk germanium pack in a tetrahedral “diamond” lattice. Small silicon and germanium clusters with n ≤ 10 also have identical geometries. We performed a systematic ground state search for Gen and Ge+n up to 16 atoms. Like silicon clusters, medium-sized germanium clusters build up by stacking TTP subunits but the global minima for sizes starting from n = 13 differ in details indicating that the growth patterns of silicon and germanium clusters diverge after n = 12. Global minima search for silicon clusters (n = 6–14) on the Si(111)7 x 7 surface were also carried out using both simulated annealing and a genetic algorithm. For n = 6 and n = 7, cluster atoms are anchored to the surfaces to saturate the dangling bonds of the surfaces but the cluster atoms are not bonded together directly. Starting from n = 8, cluster atoms bond together and the clusters begin to grow in three dimensions for n ≥ 13.
机译:我们已经对 Si + n < / f> Si - n <在密度泛函理论(DFT)的范围内,具有局部密度近似(LDA)和广义梯度近似(GGA)的尺寸范围3≤n≤20。计算并比较了各种性质,例如中性簇的电离势,阴离子的垂直脱离能和光电子能谱,阳离子的裂解途径和离解能以及阴离子和阳离子的迁移率。中型团簇(10≤n≤20)的结构通常遵循长条状的“堆叠式Si 9 三重三角棱镜(TTP)”模式。大块硅和大块锗都包裹在一个四面体“菱形”晶格中。 n≤10的小型硅和锗簇也具有相同的几何形状。我们对Ge n Ge + < mit> n 最多16个原子。像硅团簇一样,中型锗团簇通过堆叠TTP亚基而建立,但是从n = 13开始的尺寸的全局最小值在细节上有所不同,这表明在n = 12之后,硅和锗团簇的生长方式有所不同。还使用模拟退火和遗传算法在Si(111)7 x 7表面上进行了簇(n = 6-14)。对于n = 6和n = 7,簇原子锚固到表面以使表面的悬空键饱和,但是簇原子没有直接键合在一起。从n = 8开始,簇原子键合在一起,并且在n≥13时,簇开始在三个维度上生长。

著录项

  • 作者

    Liu, Bei.;

  • 作者单位

    Iowa State University.;

  • 授予单位 Iowa State University.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2001
  • 页码 93 p.
  • 总页数 93
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号