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Development of green electroluminescent terbium doped zinc sulfide thin film phosphors.

机译:绿色电致发光掺do硫化锌薄膜荧光粉的开发。

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摘要

Alternating current thin film electroluminescent (ACTFEL) phosphors based on ZnS:Tb were fabricated by R.F. magnetron sputtering. The brightness and efficiency of the devices were improved by controlling deposition parameters such as target configuration and sputtering gas composition, in addition to codoping using Ag, Cu and Ce. By using a ZnS:TbOF single pressed power target, the brightness at 40V above threshold (B40) was improved to 89 cd/m2 compared to 44 cd/m2 for films deposited from two separate ZnS and TbOF targets. This increase of brightness is attributed to improved crystallinity due to reduced negative ion resputtering (NIR) effects from O and F. Sputter-deposition of ZnS:TbOF films using Ar + He mixture (the He gas concentration was changed from 0% to 70%) also improved the crystallinity of deposited film. However, the brightness of the device decreases from 64 cd/m2 for films deposited with pure Ar atmosphere to 45–54 cd/m2 for 60–70% He gas concentrations. This brightness decrease is attributed to an increased dielectric constant (from 12 for pure Ar to 17 at 70% He) and decreased RMS surface roughness (from 6.7 nm for pure Ar to 4.3 nm at 70% He). To investigate the effects of oxygen incorporation, ZnS:Tb,F films were deposited from a ZnS:TbF3 target with an oxygen flow. ZnS:Tb,F films show the best brightness (82 cd/m2) at 3.6 at. % of oxygen concentration in the deposited film, with a very sharp drop off in brightness from either underdoping (56 cd/m2 at 2.2 at. % oxygen) or overdoping (42 cd/m2 at 8.1 at. % oxygen). The brightness improvement by oxygen incorporation can be attributed to an increased conduction charge. The brightness decrease by oxygen overdoping is attributed to both a decreased excitation and a decreased radiative efficiency. After annealing at 500°C for 60 minutes, Ce codoping increases the B40 to 144 cd/m 2 compared to 86 cd/m2 of uncodoped ZnS:TbOF films. This brightness improvement is attributed to an increased radiative efficiency. At V20, the radiative efficiency of Ce codoped films is improved by ≈130%. The non-linear exponential decay of the electroluminescent emission for Ce codoped films is attributed to an energy transfer from Ce+3 to Tb+3 luminescent centers. After annealing at 500°C for 60 minutes, Ag + Cu codoped ZnS:TbOF thin film phosphor also showed increased brightness at 20V above threshold, B20 of 67 cd/m2 compared to 55 cd/m 2 for uncodoped ZnS:TbOF films. The increased brightness for Cu + Ag codoped ZnS:TbOF film is attributed to increased surface roughness and improved excitation efficiency caused by space charge modification due to Ag+1 and Cu+1 codoping.
机译:R.F.制造了基于ZnS:Tb的交流电薄膜电致发光(ACTFEL)荧光粉。磁控溅射。除了使用Ag,Cu和Ce共掺杂外,还通过控制沉积参数(例如靶结构和溅射气体成分)来提高器件的亮度和效率。通过使用ZnS:TbOF单按功率目标,高于阈值(B 40 )40V时的亮度从44 cd / m <提高到89 cd / m 2 super> 2 用于从两个单独的ZnS和TbOF靶沉积的膜。亮度的增加归因于O -和F -减少的负离子溅射(NIR)效应,从而提高了结晶度。使用Ar + He混合物(He气体浓度从0%更改为70%)溅射沉积ZnS:TbOF薄膜也提高了沉积膜的结晶度。但是,器件的亮度从纯Ar气氛下沉积的薄膜的64 cd / m 2 降低到60-70%氦气的45–54 cd / m 2 浓度。这种亮度降低归因于介电常数的增加(从纯Ar的12降低到70%He的17)和RMS表面粗糙度降低(从纯Ar的6.7 nm到70%He的4.3 nm)。为了研究氧气掺入的影响,用氧气流从ZnS:TbF 3 靶上沉积ZnS:Tb,F膜。 ZnS:Tb,F薄膜在3.6 at时显示出最佳亮度(82 cd / m 2 )。 %的沉积膜中氧浓度,亮度的急剧下降是由于掺杂不足(在2.2 at。%的氧气浓度为56 cd / m 2 )或掺杂过量(42 cd / m 2 在8.1 at。%的氧气下)。通过掺入氧气来提高亮度可以归因于增加的导电电荷。氧过量掺杂导致的亮度降低归因于激发减少和辐射效率降低。在500°C退火60分钟后,铈共掺杂将B 40 增加到144 cd / m 2 ,而86 cd / m 2 未掺杂的ZnS:TbOF薄膜的制备。这种亮度的提高归因于辐射效率的提高。在V 20 时,铈共掺杂薄膜的辐射效率提高了约130%。 Ce共掺杂薄膜的电致发光发射的非线性指数衰减归因于从Ce +3 到Tb +3 发光中心的能量转移。在500°C退火60分钟后,Ag + Cu共掺杂的ZnS:TbOF薄膜荧光粉在高于阈值的20V时也显示出增加的亮度,B20为67 cd / m2,而55 cd / m 2 未掺杂的ZnS:TbOF薄膜。 Cu + Ag共掺杂的ZnS:TbOF薄膜亮度的增加归因于由于Ag +1 和Cu +1 引起的空间电荷修饰导致表面粗糙度增加和激发效率提高。共掺杂。

著录项

  • 作者

    Kim, Jongpyo.;

  • 作者单位

    University of Florida.;

  • 授予单位 University of Florida.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2001
  • 页码 197 p.
  • 总页数 197
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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