Silicon tetrachloride plasma induced grafting for starch-based composites.

摘要

Non-modified virgin starch is seldom used directly in industrial applications. Instead, it is often physically and/or chemically modified to achieve certain enhanced properties. For many of the non-food applications, these modifications involve changing its hydrophilicity to create hydrophobic starch.; In this study, the hydrophobic starch was produced through silicon tetrachloride (SiCl₄) plasma induced graft polymerization, so that it could be used as a renewable and biodegradable component of, or substitute for, the petrochemical-based plastics. It was suggested that this starch graft-copolymer might be used as reinforcing components in silicone-rubber materials for starch-based composites.; To make this starch graft-copolymer, the ethyl ether-extracted starch powders were surface functionalized by SiCl₄ plasma using a 13.56 MHz radio frequency rotating plasma reactor and subsequently stabilized by either ethylene diamine or dichlorodimethylsilane (DCDMS). The functionalized starch was then graft-polymerized with DCDMS to form polydimethylsiloxane (PDMS) layers around the starch granules. The presence of this PDMS layer was demonstrated by electron spectroscopy for chemical analysis (ESCA/XPS), Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), gas chromatography-mass spectroscopy (GC-MS), thermo gravimetry/differential thermal analysis (TG/DTA), and other analyses. It was shown that the surface morphology, thermal properties, swelling characteristic, and hydrophilicity of starch were all changed due to the existence of this protective hydrophobic PDMS layer.; Several different procedures to carry out the functionalization and graft polymerization steps were evaluated to improve the effectiveness of the reactions and to prevent the samples from being hydrolyzed by the grafting byproduct HCl. Actinometry, GC-MS, and residual gas analyzer (RGA) were used to investigate the mechanisms of the SiCl₄ discharge and to optimize the plasma modification. These plasma diagnostic results showed that, to achieve better plasma modification, higher plasma power and lower SiCl₄ vapor pressure would be needed; however, it was found that the efficiency of the modification peaked at a certain point of plasma treatment time (∼10 minutes) and there was not much subsequent improvement with prolonged plasma treatment.