首页> 外文学位 >Degradation of fluorine-containing organic thin films and organohalides mediated by ionizing radiation: Nitrogen-based surface modification of polymers and metallization of nitrogen-containing polymers.
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Degradation of fluorine-containing organic thin films and organohalides mediated by ionizing radiation: Nitrogen-based surface modification of polymers and metallization of nitrogen-containing polymers.

机译:电离辐射介导的含氟有机薄膜和有机卤化物的降解:聚合物的氮基表面改性和含氮聚合物的金属化。

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The surface modification of organic thin films and polymers has been studied using X-rays, electrons, ions, excited neutrals and metal atoms (metallization). The resulting chemical modification within the surface region has been studied to better understand the role of individual reactive species with the organic interfaces. Similarly, the role of electrons in organohalide remediation has been studied to better understand the remediation process occurring in organohalide/ice films.; During the initial period of X-ray irradiation of semi-fluorinated self-assembled monolayers (SAMs), electron-stimulated C-F, C-C and S-X (X = copper or gold substrate) bond breaking events are responsible for the changes in the chemical composition of the SAM. Irradiation-induced changes to the film's chemical and structural properties, that included the chemical transformation of a fraction of the initial thiolate species, were most pronounced in these initial stages of irradiation, prior to the development of a highly cross-linked carbonaceous overlayer. The mechanism of the carbon-fluorine bond breaking within the film has been found to be consistent with a series of single C-F bond breaking events.; The surface reactions of reactive neutral nitrogen species and nitrogen ions with polyethylene have also been studied. Neutral nitrogen species, generated using a modified nitrogen plasma, resulted in the incorporation of predominantly imine groups. Nitrogen ion bombardment yielded amine groups as the dominate species.; The reactivity of vapor-deposited metal atoms with nylon 6, nitrogen ion implanted polyethylene and a nitrile-terminated SAM have also been studied using in situ X-ray Photoelectron Spectroscopy. Iron deposition resulted in the formation of iron-nitrogen linkages for all systems studied and iron-oxygen linkages in the case of nylon 6. Similarly, Nickel deposition resulted in nickel-nitrogen linkages for all the systems studied, however it did not react with the oxygen. Copper deposition resulted in the formation of copper-nitrogen linkages on nylon 6, but was unreactive with all other systems studied. Gold was unreactive on all of the substrates studied. The relative reactivity of different polymer functional groups has been rationalized on the basis of their respective bond strengths while metal reactivity trends are correlated with the strength of new metal-oxygen and metal-nitrogen bonds that can form during metallization.; The electron-stimulated chemical reactions within carbon tetrachloride/water(ice) films produced CO2, CO and HCl as the final neutral reaction products in the degradation of CCl4, while COCl2 and C2 Cl4 were produced as reactive intermediates. The CCl 4 concentration effects on the film were shown to vary the partitioning of products and intermediates within the film but did not induce new species production. A reaction mechanism is postulated based on the reactivity of the trichloromethyl radical and the dichlorocarbene intermediates.
机译:已经使用X射线,电子,离子,激发的中性粒子和金属原子(金属化)研究了有机薄膜和聚合物的表面改性。已经对表面区域内发生的化学修饰进行了研究,以更好地理解具有有机界面的单个反应物种的作用。同样,已经研究了电子在有机卤化物修复中的作用,以更好地了解有机卤化物/冰膜中发生的修复过程。在半氟化自组装单分子层(SAM)的X射线辐射初期,电子激发的CF,CC和SX(X =铜或金基质)的键断裂事件是造成碳原子化学组成变化的原因。 SAM。在形成高度交联的碳质覆盖层之前,在辐照的这些初始阶段中,辐照引起的膜化学和结构性能变化(包括部分初始硫醇盐物种的化学转化)最为明显。已经发现膜内碳-氟键断裂的机理与一系列单C-F键断裂事件一致。还研究了反应性中性氮物种和氮离子与聚乙烯的表面反应。使用改良的氮等离子体产生的中性氮物质导致主要是亚胺基的结合。氮离子轰击产生氨基作为主要种类。气相沉积的金属原子与尼龙6,氮离子注入的聚乙烯和腈基SAM的反应性也已使用就地 X射线光电子能谱进行了研究。铁沉积导致所有研究系统形成铁-氮键,尼龙6形成铁-氧键。类似地,镍沉积导致所有研究系统形成镍-氮键,但是它不与镍反应。氧。铜的沉积导致尼龙6上形成铜-氮键,但与所有其他研究的系统均无反应。金在所有研究的底物上都没有反应。已经根据它们各自的键强度合理化了不同聚合物官能团的相对反应性,而金属反应性趋势与金属化过程中可能形成的新的金属-氧和金属-氮键的强度相关。四氯化碳/水(冰)薄膜中的电子激发化学反应在降解CCl 4 时产生最终的中性反应产物CO 2 ,CO和HCl,而生产了COCl 2 和C 2 Cl 4 作为反应中间体。结果表明,CCl 4 浓度对膜的影响可改变膜内产物和中间体的分配,但不会诱导新物质的产生。根据三氯甲基自由基与二氯卡宾中间体的反应性推测反应机理。

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